Patents by Inventor Christopher C. Striemer

Christopher C. Striemer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210239689
    Abstract: Understanding the amount of exposure individuals have had to common chemical pollutants critically requires the ability to detect those compounds in a simple, sensitive, and specific manner. Doing so using label-free biosensor technology has proven challenging, however, given the small molecular weight of many pollutants of interest. To address this issue, a pollutant microarray based on the label-free Arrayed Imaging Reflectometry (AIR) detection platform was developed. The sensor that has undergone a two-step blocking process is able to detect three common environmental contaminants (benzo[a]pyrene (200), bisphenol A (202), and acrolein (204 and 206) in human serum via a competitive binding scheme.
    Type: Application
    Filed: February 11, 2021
    Publication date: August 5, 2021
    Inventors: Jared A. CARTER, Emily J. TRIPLETT, Christopher C. STRIEMER, Benjamin L. MILLER
  • Patent number: 10668436
    Abstract: Provided are monolithic structures comprising one or more suspended, nanoporous membranes that are in contact with one or more fluidic cavities, methods of making same, and exemplary uses of same. The monolithic structures can be formed using a transmembrane etch. The monolithic structures can be used, as examples, as filters and filtration modules in microfluidic devices, dialysis devices, and concentration devices in laboratory, industrial, and medical processes.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: June 2, 2020
    Assignee: SiMPore Inc.
    Inventors: Christopher C. Striemer, Joshua J. Miller, Jon-Paul S. Desormeaux, James A. Roussie
  • Patent number: 10551165
    Abstract: This present disclosure generally relates to devices, methods, and systems for producing large numbers of SiO2 coated silicon chips with uniform film thickness controlled to angstrom and sub angstrom levels. The disclosure further relates to etching plates configured for receiving a plurality of chips mounted thereon.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: February 4, 2020
    Assignee: ADARZA BIOSYSTEMS, INC.
    Inventors: Christopher C. Striemer, Jared A. Carter, Wade Campney
  • Patent number: 10391219
    Abstract: Provided are nanoporous silicon nitride membranes and methods of making such membranes. The membranes can be part of a monolithic structure or free-standing. The membranes can be made by transfer of the nanoporous structure of a nanoporous silicon or silicon oxide film by, for example, reactive ion etching. The membranes can be used in, for example, filtration applications, hemodialysis applications, hemodialysis devices, laboratory separation devices, multi-well cell culture devices, electronic biosensors, optical biosensors, active pre-concentration filters for microfluidic devices.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: August 27, 2019
    Assignee: SiMPore, Inc.
    Inventors: Christopher C. Striemer, Jon-Paul DesOrmeaux
  • Publication number: 20180304206
    Abstract: Provided are monolithic structures comprising one or more suspended, nanoporous membranes that are in contact with one or more fluidic cavities, methods of making same, and exemplary uses of same. The monolithic structures can be formed using a transmembrane etch. The monolithic structures can be used, as examples, as filters and filtration modules in microfluidic devices, dialysis devices, and concentration devices in laboratory, industrial, and medical processes.
    Type: Application
    Filed: October 31, 2016
    Publication date: October 25, 2018
    Inventors: Christopher C. STRIEMER, Joshua J. MILLER, Jon-Paul S. DESORMEAUX, James A. ROUSSIE
  • Publication number: 20180147336
    Abstract: Provided are nanoporous silicon nitride membranes and methods of making such membranes. The membranes can be part of a monolithic structure or free-standing. The membranes can be made by transfer of the nanoporous structure of a nanoporous silicon or silicon oxide film by, for example, reactive ion etching. The membranes can be used in, for example, filtration applications, hemodialysis applications, hemodialysis devices, laboratory separation devices, multi-well cell culture devices, electronic biosensors, optical biosensors, active pre-concentration filters for microfluidic devices.
    Type: Application
    Filed: October 13, 2017
    Publication date: May 31, 2018
    Inventors: Christopher C. Striemer, Jon-Paul DesOrmeaux
  • Publication number: 20180143005
    Abstract: This present disclosure generally relates to devices, methods, and systems for producing large numbers of SiO2 coated silicon chips with uniform film thickness controlled to angstrom and sub angstrom levels. The disclosure further relates to etching plates configured for receiving a plurality of chips mounted thereon.
    Type: Application
    Filed: April 29, 2016
    Publication date: May 24, 2018
    Inventors: Christopher C. STRIEMER, Jared A. CARTER, Wade CAMPNEY
  • Patent number: 9945030
    Abstract: Provided is a free-standing silicon oxide film that is under tensile stress. Also, provided are methods of making a free-standing silicon oxide film that is under tensile stress. The methods use low-power PECVD deposition of silicon oxide. Methods of imaging one or more objects (e.g., cells) using a free-standing silicon oxide film that is under tensile stress is also provided.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: April 17, 2018
    Assignee: SiMPore Inc.
    Inventors: Jon-Paul DesOrmeaux, Christopher C. Striemer
  • Patent number: 9789239
    Abstract: Provided are nanoporous silicon nitride membranes and methods of making such membranes. The membranes can be part of a monolithic structure or free-standing. The membranes can be made by transfer of the nanoporous structure of a nanoporous silicon or silicon oxide film by, for example, reactive ion etching. The membranes can be used in, for example, filtration applications, hemodialysis applications, hemodialysis devices, laboratory separation devices, multi-well cell culture devices, electronic biosensors, optical biosensors, active pre-concentration filters for microfluidic devices.
    Type: Grant
    Filed: August 15, 2014
    Date of Patent: October 17, 2017
    Assignee: SiMPore, Inc.
    Inventors: Christopher C. Striemer, Jon-Paul DesOrmeaux
  • Publication number: 20160340778
    Abstract: Provided is a free-standing silicon oxide film that is under tensile stress. Also, provided are methods of making a free-standing silicon oxide film that is under tensile stress. The methods use low-power PECVD deposition of silicon oxide. Methods of imaging one or more objects (e.g., cells) using a free-standing silicon oxide film that is under tensile stress is also provided.
    Type: Application
    Filed: November 19, 2014
    Publication date: November 24, 2016
    Inventors: Jon-Paul DesOrmeaux, Christopher C. Striemer
  • Publication number: 20160199787
    Abstract: Provided are nanoporous silicon nitride membranes and methods of making such membranes. The membranes can be part of a monolithic structure or free-standing. The membranes can be made by transfer of the nanoporous structure of a nanoporous silicon or silicon oxide film by, for example, reactive ion etching. The membranes can be used in, for example, filtration applications, hemodialysis applications, hemodialysis devices, laboratory separation devices, multi-well cell culture devices, electronic biosensors, optical biosensors, active pre-concentration filters for microfluidic devices.
    Type: Application
    Filed: August 15, 2014
    Publication date: July 14, 2016
    Inventors: Christopher C. Striemer, Jon-Paul DesOrmeaux
  • Publication number: 20160115951
    Abstract: Thin pnc-Si membranes operate as high-flow-rate EOPs at low applied voltages. In at least some instances, this may be due to the small electrical resistance presented by the membrane and high electric fields across the molecularly thin membrane. The normalized flow rates of some pnc-Si EOPs may be 20 times to several orders of magnitude higher than other low-voltage EOPs.
    Type: Application
    Filed: October 27, 2014
    Publication date: April 28, 2016
    Inventors: Jessica Snyder, James McGrath, Philippe Fauchet, Thomas Gaborski, Christopher C. Striemer
  • Patent number: 8518276
    Abstract: A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: August 27, 2013
    Assignee: University of Rochester
    Inventors: Christopher C. Striemer, Philippe M. Fauchet, Thomas R. Gaborski, James L. McGrath
  • Publication number: 20120267337
    Abstract: A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
    Type: Application
    Filed: April 20, 2012
    Publication date: October 25, 2012
    Applicant: UNIVERSITY OF ROCHESTER
    Inventors: Christopher C. STRIEMER, Philippe M. FAUCHET, Thomas R. GABORSKI, James L. MCGRATH
  • Publication number: 20120171087
    Abstract: The present invention is drawn to methods for facilitating fluid flow through the nanopores of membranes, i.e., through sub-micron pores. The present invention is also directed to one or more apparatus for such fluid flow, and for nanoporous membranes modified to facilitate such fluid flow.
    Type: Application
    Filed: October 1, 2010
    Publication date: July 5, 2012
    Applicant: SIMPORE, INC.
    Inventors: Thomas R. Gaborski, James L. McGrath, Richard D. Richmond, Christopher C. Striemer
  • Patent number: 8182590
    Abstract: A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: May 22, 2012
    Assignee: University of Rochester
    Inventors: Christopher C. Striemer, Philippe M. Fauchet, Thomas R. Gaborski, James L. McGrath
  • Patent number: 8119394
    Abstract: Disclosed is a device for co-culturing two or more populations of cells using ultrathin, porous membranes positioned between cell culture chambers. Multiple chamber devices and uses thereof are described, including the formation of in vitro tissue models for studying drug delivery, cell-cell interactions, and the activity of low abundance molecular species.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: February 21, 2012
    Assignee: University of Rochester
    Inventors: James L. McGrath, Thomas R. Gaborski, Christopher C. Striemer, Philippe M. Fauchet
  • Patent number: 7922795
    Abstract: A nanoscale membrane exposed on opposite sides thereof and having an average thickness of less than about 100 nm, and a lateral length to thickness aspect ratio that is more than 10,000 to 1 is disclosed. Also disclosed are methods of making such membranes, and use thereof in a number of devices including fuel cells, sensor devices, electrospray devices, and supports for examining a sample under electron microscopy.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: April 12, 2011
    Assignee: University of Rochester
    Inventors: Christopher C. Striemer, Philippe M. Fauchet
  • Patent number: 7692798
    Abstract: A method of sensing at least one target on a receptor having a substrate and a translucent coating includes minimizing interference fringe patterns in an image of the target. The method also includes passing the image of the target through an imaging system intermediate the receptor and a detector.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: April 6, 2010
    Assignee: Adarza Biosystems, Inc.
    Inventors: Christopher C. Striemer, Andrew J. Murnan, Nestor O. Farmiga
  • Publication number: 20080068615
    Abstract: A method of sensing at least one target on a receptor having a substrate and a translucent coating includes minimizing interference fringe patterns in an image of the target. The method also includes passing the image of the target through an imaging system intermediate the receptor and a detector.
    Type: Application
    Filed: September 14, 2007
    Publication date: March 20, 2008
    Inventors: Christopher C. Striemer, Andrew J. Murnan, Nestor O. Farmiga