Patents by Inventor Christopher Charles Griffin

Christopher Charles Griffin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alternate gas delivery and evacuation system for plasma processing apparatuses
    Patent number: 8202393
    Abstract: A gas distribution system for supplying a gas mixture to a plasma process chamber is provided. A first valve arrangement is connected to upstream ends of a first gas line and a second gas line. A second valve arrangement is connected to downstream ends of the first gas line and the second gas line. A first gas distribution outlet line is connected between a gas supply and the first valve arrangement and a first chamber inlet line connected between the second valve arrangement and the plasma process chamber. A first evacuation line is connected to the first gas line at a location between the first valve arrangement and the second valve arrangement. A second evacuation line is connected to the second gas line at a location between the first valve arrangement and the second valve arrangement. The first evacuation line and second evacuation line are in fluid communication with a vacuum line.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: June 19, 2012
    Assignee: Lam Research Corporation
    Inventors: Harry P. Wong, Vernon Wong, Christopher Charles Griffin, Mark Taskar
  • Alternate gas delivery and evacuation system for plasma processing apparatuses
    Publication number: 20090061640
    Abstract: A gas distribution system for supplying a gas mixture to a plasma process chamber is provided. A first valve arrangement is connected to upstream ends of a first gas line and a second gas line. A second valve arrangement is connected to downstream ends of the first gas line and the second gas line. A first gas distribution outlet line is connected between a gas supply and the first valve arrangement and a first chamber inlet line connected between the second valve arrangement and the plasma process chamber. A first evacuation line is connected to the first gas line at a location between the first valve arrangement and the second valve arrangement. A second evacuation line is connected to the second gas line at a location between the first valve arrangement and the second valve arrangement. The first evacuation line and second evacuation line are in fluid communication with a vacuum line.
    Type: Application
    Filed: August 22, 2008
    Publication date: March 5, 2009
    Applicant: Lam Research Corporation
    Inventors: Harry P. Wong, Vernon Wong, Christopher Charles Griffin, Mark Taskar