Patents by Inventor Christopher Charles Walton

Christopher Charles Walton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Planarization of optical substrates
    Patent number: 10901121
    Abstract: A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: January 26, 2021
    Assignees: Lawrence Livermore National Security, LLC, Colorado State University Research Foundation
    Inventors: Christopher J. Stolz, James A. Folta, Paul B. Mirkarimi, Regina Soufli, Christopher Charles Walton, Justin Wolfe, Carmen Menoni, Dinesh Patel
  • PLANARIZATION OF OPTICAL SUBSTRATES
    Publication number: 20190162879
    Abstract: A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.
    Type: Application
    Filed: November 7, 2018
    Publication date: May 30, 2019
    Applicant: Lawrence Livermore National Security, LLC
    Inventors: Christopher J. Stolz, James A. Folta, Paul B. Mirkarimi, Regina Soufli, Christopher Charles Walton, Justin Wolfe, Carmen Menoni, Dinesh Patel
  • Method and system using power modulation and velocity modulation producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients
    Patent number: 6668207
    Abstract: A method and system for determining a source flux modulation recipe for achieving a selected thickness profile of a film to be deposited (e.g., with highly uniform or highly accurate custom graded thickness) over a flat or curved substrate (such as concave or convex optics) by exposing the substrate to a vapor deposition source operated with time-varying flux distribution as a function of time. Preferably, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: December 23, 2003
    Assignee: The United States of America
    Inventors: Claude Montcalm, James Allen Folta, Christopher Charles Walton