Patents by Inventor Christopher Charles WARD

Christopher Charles WARD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10788763
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: September 29, 2020
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
  • Patent number: 10642166
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 5, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
  • Publication number: 20190346777
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 14, 2019
    Applicants: ASML NETHERLANDS B. V., ASML HOLDING N. V.
    Inventors: Günes NAKÍBOGLU, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergun CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
  • Patent number: 10423081
    Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: September 24, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Venturino, Geoffrey Alan Schultz, Daniel Nicholas Galburt, Daniel Nathan Burbank, Santiago E. Delpuerto, Herman Vogel, Johannes Onvlee, Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward
  • Patent number: 10394139
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: August 27, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Güneş Nak{dot over (i)}bo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
  • Patent number: 10281830
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: May 7, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward, Marc Léon Van Der Gaag, Johan Gertrudis Cornelis Kunnen
  • Publication number: 20190121248
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Application
    Filed: March 8, 2017
    Publication date: April 25, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Günes NAKIBOGLU, Lowell Lane BAKER, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergün CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
  • Patent number: 10031428
    Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: July 24, 2018
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven, Henricus Anita Jozef Wilhemus Van De Ven, José Nilton Fonseca Junior, Frank Johannes Jacobus Van Boxtel, Daniel Nathan Burbank, Erik Roelof Loopstra, Johannes Onvlee, Mark Josef Schuster, Robertus Nicodemus Jacobus Van Ballegoij, Christopher Charles Ward, Jan Steven Christiaan Westerlaken
  • Publication number: 20180196360
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Application
    Filed: June 17, 2016
    Publication date: July 12, 2018
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD, Marc Léon VAN DER GAAG, Johan Gertrudis Cornelis KUNNEN
  • Patent number: 9977351
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: May 22, 2018
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Patent number: 9910368
    Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: March 6, 2018
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Daniel Nathan Burbank, Mark Josef Schuster, Peter James Graffeo
  • Patent number: 9857694
    Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
    Type: Grant
    Filed: March 5, 2015
    Date of Patent: January 2, 2018
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bearrach Moest, Peter A. Delmastro, Johannes Onvlee, Adrianus Martinus Van Der Wielen, Christopher Charles Ward
  • Publication number: 20170363973
    Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.
    Type: Application
    Filed: December 2, 2015
    Publication date: December 21, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas VENTURINO, Geoffrey Alan SCHULTZ, Daniel Nicholas GALBURT, Daniel Nathan BURBANK, Santiago E. DELPUERTO, Herman VOGEL, Johannes ONVLEE, Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD
  • Publication number: 20170307986
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: July 13, 2017
    Publication date: October 26, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9766557
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: September 19, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Patent number: 9740112
    Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.
    Type: Grant
    Filed: September 23, 2013
    Date of Patent: August 22, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Arindam Sinharoy, Stephen S. Roux, Jean-Philippe Xavier Van Damme, Daniel Nathan Burbank, Mark Josef Schuster, Duncan Harris, Christopher Charles Ward
  • Publication number: 20170160652
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 8, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9632429
    Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Christopher Charles Ward, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christiaan Louis Valentin
  • Patent number: 9632434
    Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
  • Patent number: 9632433
    Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame