Patents by Inventor Christopher CHYU

Christopher CHYU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Flip-chip LED, method for manufacturing the same and flip-chip package of the same
    Patent number: 9559265
    Abstract: A flip-chip LED, a method for manufacturing the same and a flip-chip LED package are revealed. The LED includes at least one multi-layer reflective layer covered over the outermost layer thereof. The multi-layer reflective layer includes non-conductive reflective layer or combination of the non-conductive reflective layer with conductive reflective layer. The multi-layer reflective layer is manufactured by physical vapor deposition (PVD) with a mask at one time. The mask is used to form a pattern of the multi-layer reflective layer. Thus a photoresist layer is further formed on surface of exposed electrodes. Then a pumping and venting process is used only once during to complete vacuum deposition of each layer of the multi-layer reflective layer in turn.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: January 31, 2017
    Assignee: MAO BANG ELECTRONIC CO., LTD.
    Inventors: Christopher Chyu, Ta-Lun Sung, Tung-Sheng Lai
  • FLIP-CHIP LED, METHOD FOR MANUFACTURING THE SAME AND FLIP-CHIP PACKAGE OF THE SAME
    Publication number: 20150270448
    Abstract: A flip-chip LED, a method for manufacturing the same and a flip-chip LED package are revealed. The LED includes at least one multi-layer reflective layer covered over the outermost layer thereof. The multi-layer reflective layer includes non-conductive reflective layer or combination of the non-conductive reflective layer with conductive reflective layer. The multi-layer reflective layer is manufactured by physical vapor deposition (PVD) with a mask at one time. The mask is used to form a pattern of the multi-layer reflective layer. Thus a photoresist layer is further formed on surface of exposed electrodes. Then a pumping and venting process is used only once during to complete vacuum deposition of each layer of the multi-layer reflective layer in turn.
    Type: Application
    Filed: March 20, 2015
    Publication date: September 24, 2015
    Inventors: Christopher CHYU, Ta-Lun SUNG, Tung-Sheng LAI