Abstract: A process and apparatus for dynamically adjusting the exposure dose on a photosensitive coating at a localized area within an exposure field in a step-and-scan lithography system. The process and apparatus form a pattern on a photosensitive substrate, such as used in the integrated circuit manufacturing industry. The exposure dose is adjusted at a localized area by a segmented slit system or an array of light-transmitting pixels located across the exposure field. The slit segments or individual pixels are automatically controlled in response to data obtained regarding the uniformity of the projection optics system or the mask pattern.

Abstract: An integrated circuit chip and an electronic system are disclosed, each incorporating a self-test system. The integrated circuit chip includes capability for Built In Self Test (BIST) and a non-volatile memory where the BIST may be self-programmable. The electronic system comprises, an integrated circuit chip which includes on the chip Built In Self Test (BIST) and a non-volatile memory, together with an off-chip test target. The integrated circuit chip and the electronic system are particularly useful for simplifying the testing of electronic products both in manufacturing and in the field, and are even more particularly useful in eliminating the need for large, complex, high speed testers in the manufacturing environment, substituting instead a simple power chuck to plug the product into.