Patents by Inventor Christopher Daniel Hruska

Christopher Daniel Hruska has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9120073
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Grant
    Filed: June 5, 2009
    Date of Patent: September 1, 2015
    Assignee: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska
  • Publication number: 20140246381
    Abstract: A system for performing ozone water treatment comprises a voltage supply circuit and a plasma eductor reactor. The voltage supply circuit includes an H-bridge controller and driver, a transformer, and an output port. The H-bridge controller and driver are configured to switch the electrical polarity of a pair of terminals. A primary of the transformer is connected to the H-bridge driver and controller. A secondary of the transformer connects in parallel with a first capacitor and in series with an inductor and a second capacitor. The output port connects in parallel with the second capacitor. The plasma eductor reactor includes an electric field generator, a flow spreader, and a diffuser. The electric field generator includes a pair of electrodes that generate an electric field. The flow spreader supplies a stream of oxygen. The diffuser supplies a stream of water. The streams of water and oxygen pass through the electric field.
    Type: Application
    Filed: February 24, 2014
    Publication date: September 4, 2014
    Applicant: EON LABS,LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska, David Forsee
  • Publication number: 20100310434
    Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
    Type: Application
    Filed: June 5, 2009
    Publication date: December 9, 2010
    Applicant: EON LABS, LLC
    Inventors: Walter Riley Buchanan, Christopher Daniel Hruska