Abstract: Aspects of the invention relate to retargeting based on process window simulation to fix hotspots. The process window simulation is performed to generate process window information. Edge fragments are selected for retargeting. Based on the process window information, the selected edge fragments are retargeted in a balanced way.

Abstract: Layout design data are decomposed for double dipole lithography based on partial intensity distribution information. The partial intensity distribution information is generated by performing optical simulations on the layout design data. The layout decomposition may further be adjusted during an optical proximity correction process. The adjustment may utilize the partial intensity distribution information.

Abstract: Techniques for performing optical proximity correction on a layout design or portion thereof are provided with various implementations of the invention. With various implementations of the invention, movement and simulation of selected edge fragments is disabled during the optical proximity correction process. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is then performed for the edge fragments that remain enabled. With further implementations of the invention, a simulation site is defined for ones of the edge fragments. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is performed for each simulation site. Additionally, during the optical proximity correction process, the simulations sites may be moved and or removed individually based on various conditions.

Abstract: Layout design data are decomposed for double dipole lithography based on partial intensity distribution information. The partial intensity distribution information is generated by performing optical simulations on the layout design data. The layout decomposition may further be adjusted during an optical proximity correction process. The adjustment may utilize the partial intensity distribution information.

Abstract: Aspects of the invention relate to retargeting based on process window simulation to fix hotspots. The process window simulation is performed to generate process window information. Edge fragments are selected for retargeting. Based on the process window information, the selected edge fragments are retargeted in a balanced way.

Abstract: Techniques for performing optical proximity correction on a layout design or portion thereof are provided with various implementations of the invention. With various implementations of the invention, movement and simulation of selected edge fragments is disabled during the optical proximity correction process. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is then performed for the edge fragments that remain enabled. With further implementations of the invention, a simulation site is defined for ones of the edge fragments. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is performed for each simulation site. Additionally, during the optical proximity correction process, the simulations sites may be moved and or removed individually based on various conditions.