Patents by Inventor Christopher Gezon

Christopher Gezon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adaptive sampling for structured light scanning
    Patent number: 11582399
    Abstract: A system to process images includes a light source configured to emit a first illumination pattern onto one or more first portions of a scene. The system also includes an image sensor configured to capture light reflected from the scene in response to the emitted first illumination pattern. The system also includes an optimizer configured to perform raytracing of the light reflected from the scene. The system further includes a processor operatively coupled to the optimizer. The processor is configured to determine a parameter of a surface of the scene based on the raytracing, cause the light source to emit a second illumination pattern onto one or more second portions of the scene based at least in part on the parameter of the surface, and refine the parameter of the surface of the scene based on additional raytracing performed on reflected light from the second illumination pattern.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: February 14, 2023
    Assignee: Northwestern University
    Inventors: Nathan S. Matsuda, Oliver Strider Cossairt, Jesse Chang, Christopher Gezon
  • ADAPTIVE SAMPLING FOR STRUCTURED LIGHT SCANNING
    Publication number: 20200412933
    Abstract: A system to process images includes a light source configured to emit a first illumination pattern onto one or more first portions of a scene. The system also includes an image sensor configured to capture light reflected from the scene in response to the emitted first illumination pattern. The system also includes an optimizer configured to perform raytracing of the light reflected from the scene. The system further includes a processor operatively coupled to the optimizer. The processor is configured to determine a parameter of a surface of the scene based on the raytracing, cause the light source to emit a second illumination pattern onto one or more second portions of the scene based at least in part on the parameter of the surface, and refine the parameter of the surface of the scene based on additional raytracing performed on reflected light from the second illumination pattern.
    Type: Application
    Filed: March 7, 2019
    Publication date: December 31, 2020
    Inventors: Nathan S. Matsuda, Oliver Strider Cossairt, Jesse Chang, Christopher Gezon