Abstract: The present invention solves many of the problems for the wheelchair bound individual who wants an ergonomically sensible, convenient, yet powerful and stable wheelchair. The Trike's unique power source is provided by a rowing-type motion of the user rather than the less efficient “hand rim” grip or wrist propulsion. Power is generated both in the out rowing stroke and the in rowing stroke through a inventive power drive. The rowing motion significantly reduces the chances for repetitive stress injuries, like carpal tunnel. Furthermore, the rowing motion and movements are designed to facilitate efficient propulsion and steering in combination, to be effected simultaneously. The rowing motion allows the user's full arm strength and full range of motion to assist in the powering of the vehicle.

Abstract: The Trike's unique power source is provided by a rowing-type motion of the user rather than the less efficient “hand rim” grip or wrist propulsion. The rowing motion significantly reduces the chances for repetitive stress injuries, like carpal tunnel. Furthermore, the rowing motion and movements, are designed to facilitate efficient propulsion and steering in combination, to be effected simultaneously. The rowing motion allows the user's full arm strength and full range of motion to assist in the powering of the vehicle. The wheelchair also has a retractable fifth or propulsion wheel that allows the chair to be used in a confined space without sacrificing performance.

Abstract: The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal and most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafers are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers. The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled and unloaded by the robot arm. The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.

Abstract: A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the sufaces (32) of the wafers (22).

Abstract: A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the surfaces (32) of the wafers (22).

Abstract: An oven for the heat treatment of semiconductor substrates, especially a diffusion oven, having an upright, heatable quartz tube and a support system made of up rods or tubes into which one or more diffusion racks can be inserted which accommodate the wafer-like substrates separated from one another and substantially parallel to one another. To create a vertically operated oven having a rheologically efficient construction in which the support system for holding the diffusion racks will be highly variable, the support system has at least two vertical supports arranged parallel to one another, on which at least one rack rest 9 is disposed, on which rack rest the diffusion rack is placed such that the substrate wafers 8 stand substantially on edge during the treatment.

Abstract: Apparatus for introducing silicon wafers in magazines into a process tube of a furnace or diffusion oven. At least two spaced silica tubes closed at the end next adjacent the process tube constitute supporting members for the loaded magazines and a clamping device holds and supports said members cantilever-fashion by that end thereof remote from the process tube. Motor means are associated with the clamping device for moving the supporting members with the loaded magazines thereon into and out of the process tube in a substantially horizontal direction in such a manner that the magazines and their supporting members remain entirely suspended throughout the loading, processing and unloading operations: thus no part thereof comes into contact with the interior wall of the process tube.

Abstract: Articles, such as fragile, delicate semiconductor wafers, in a first carrier member are caused to pass nearly, but not quite wholly, into a second carrier member by being pushed--against gravity--thereinto. The carrier members are then subjected to a displacement, e.g. by inversion, and said articles are allowed to drop wholly into said second carrier member. The further distance travelled by the articles after rotational displacement of a housing retaining the carrier members is very small, e.g. about 2 mm.