Patents by Inventor Christopher J. MCLAUGHLIN

Christopher J. MCLAUGHLIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for optimizing a lithography exposure process
    Patent number: 11531279
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: December 20, 2022
    Assignee: Onto Innovation Inc.
    Inventors: Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
  • Conformal stage
    Patent number: 11353800
    Abstract: An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: June 7, 2022
    Assignee: Onto Innovation Inc.
    Inventors: J. Casey Donaher, Edward J. Ficarra, Christopher J. McLaughlin
  • SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
    Publication number: 20220075282
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Application
    Filed: August 20, 2021
    Publication date: March 10, 2022
    Inventors: Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
  • System and method for optimizing a lithography exposure process
    Patent number: 11126096
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: September 21, 2021
    Assignee: Onto Innovation, Inc.
    Inventors: Elvino Da Silveira, Keith Frank Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
  • CONFORMAL STAGE
    Publication number: 20200401055
    Abstract: An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.
    Type: Application
    Filed: December 21, 2018
    Publication date: December 24, 2020
    Applicant: Onto Innovation, Inc.
    Inventors: J. Casey DONAHER, Edward J. FICARRA, Christopher J. MCLAUGHLIN
  • SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
    Publication number: 20200233320
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Application
    Filed: September 28, 2018
    Publication date: July 23, 2020
    Applicant: Onto Innovation, Inc.
    Inventors: Elvino DA SILVEIRA, Keith Frank BEST, Wayne FITZGERALD, Jian LU, Xin SONG, J. Casey DONAHER, Christopher J. MCLAUGHLIN