Patents by Inventor Christopher J. S. Burgess

Christopher J. S. Burgess has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7586101
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: September 8, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J. H. Collart
  • Publication number: 20080129180
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 5, 2008
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J.S. Burgess, David George Armour, Erik J.H. Collart
  • Publication number: 20080017811
    Abstract: This invention relates to a beam stop for an ion implanter that provides a measure of the ion beam current incident thereon and that may be used for ion beam optimisation. A beam stop for an ion implanter is provided comprising a charge collector with a segmented surface provided to receive an ion beam thereon, wherein the surface is divided into at least two segments, one segment extending around the other segment, and wherein each of the two segments is operable to provide one or more signals indicative of charge collected by that segment when an ion beam is incident thereon. Such a beam stop is advantageous as it provides information on the ion beam profile without the need to scan the ion beam.
    Type: Application
    Filed: June 18, 2007
    Publication date: January 24, 2008
    Inventors: Erik J.H. Collart, Richard David Goldberg, Christopher J.S. Burgess
  • Patent number: 6847043
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: January 25, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J. H. Collart
  • Publication number: 20030197129
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Application
    Filed: December 31, 2002
    Publication date: October 23, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J.H. Collart