Abstract: An apparatus for treating a gas stream. A plasma generator generates a plasma flare. A first inlet conveys the gas stream into the apparatus. A reaction chamber is located downstream of the plasma generator in which gas is treated. A second inlet receives a liquid into the apparatus for establishing a liquid weir over an interior surface of the reaction chamber for resisting accumulation of solid deposits on the interior surface. A weir guide has an outer annular surface for directing liquid over the interior surface and an inner annular surface in flow communication with the outer surface so that liquid flows form the outer surface to the inner surface to resist depositing on the inner surface.

Abstract: In an apparatus for treating a gas stream, a plasma generator comprises an electrode for energizing a source gas to generate a plasma flare by application of a high voltage. An inlet allows the gas stream into the apparatus and directs it into the generated plasma. A scraper is fitted for reciprocating movement from a first position to a second position for scraping a surface to remove solid deposits accumulated on the surface.

Abstract: To lengthen the service period on DC plasma abatement devices a modified DC plasma torch is provided with an electrically conductive cathode and an electrically conductive anode spaced apart from one another to form a gap therebetween; a metal swirl bush at least partially located within the gap and comprising a channel adapted to permit, in use, a gas to flow through the gap; and a ceramic element interposed between any one or more of: the cathode and the swirl bush; and the anode and the swirl bush.

Abstract: To lengthen the service period on DC plasma abatement devices a modified DC plasma torch is provided with an electrically conductive cathode and an electrically conductive anode spaced apart from one another to form a gap therebetween; a metal swirl bush at least partially located within the gap and comprising a channel adapted to permit, in use, a gas to flow through the gap; and a ceramic element interposed between any one or more of: the cathode and the swirl bush; and the anode and the swirl bush.

Abstract: A method for scrubbing a halogen-containing gas, comprises contacting the halogen-containing gas with water at a temperature of at least 30° C., the gas optionally subsequently being subjected to a further treatment step comprising contacting it with water at a temperature of less than 30° C. and/or a gas dilution step. An apparatus for carrying out the method comprises a hot wash chamber (6) and optionally a cold wash chamber (7) and/or a gas dilution device (13).

Abstract: An attachment (10) for an inlet pipe (14) to a wet scrubber or other device comprises a sleeve (16) having an open end (18) adapted to be detachably connected to a flanged end (12) of the inlet pipe (14). A shaft (30) is moveable within the sleeve (16), and a scraper (34) is attached to one end of the shaft (30). The shaft (30) forms part of a pneumatic cylinder (40) attached to the other end of the sleeve (16). In use, the shaft (30) is reciprocally moved to cause the scraper (34) to dislodge particulates deposited within the pipe (14). Heated gas such as nitrogen or dry air is injected into the sleeve (16) to prevent scrubbing liquid from condensing within the sleeve (16) and thus inhibit particulate deposition therein.