Abstract: A resin including up to 99.99 weight percent (wt. %) of a first polyolefin grafted with a functional group selected from an ethylenically unsaturated carboxylic acid, a carboxylic acid anhydride, an ester functional group or a combination thereof; and 0.01 to 3.0 wt. % of a tin oxide-based catalyst, where the resin includes 0.2 wt. % to 1.5 wt. % of the functional group from the first polyolefin, the wt. % based on a total weight of the resin. The first polyolefin can be selected from a polyethylene, a polypropylene, an ethylene/alpha-olefin copolymer, a propylene/alpha-olefin copolymer and combinations thereof. The tin oxide-based catalyst can be selected from dibutyltin oxide, dioctyltin oxide and combinations thereof. The resin can be used in a multilayer structure, where a Layer A comprises the resin and a Layer B comprises a polyester, where a first major surface of Layer A is in adhering contact with the second major surface of Layer B.

Abstract: A method of making a porous film includes disposing a slurry on a substrate, solidifying the slurry to yield a film on the substrate, and subliming the organic sublimable material to yield the porous film on the substrate. The slurry includes an electrochemically active material, an electrically conductive material, and a binder dispersed in an organic sublimable material. The electrochemically active material and the electrically conductive material are different. A slurry includes a solid component including an electrochemically active material, an electrically conductive material, and a binder; and a liquid component including an organic sublimable material, wherein the electrochemically active material and the electrically conductive material are different, and the solid component is dispersed in the liquid component.

Abstract: A resealable flap device in the form of a sheet, for applying to or incorporating in packaging, comprises: a lower layer of flexible material, and an upper layer of stiff material. The sheet is cut through both layers to outline a flap portion, the cut leaving an edge in a hinge region, the upper layer being removed behind the line of the hinge region. In this way the flexible lower layer forms a hinge that is easy to handle and does not spring back, while the stiff upper layer maintains the shape of the flap.

Abstract: A resealable flap device in the form of a sheet, for applying to or incorporating in packaging, comprises: a base layer 30 of flexible material, and an upper layer 40 of stiff material. The sheet is cut (15) through both layers to outline a flap portion 14, the cut leaving an edge in a hinge region 18, the upper layer being removed behind the line of the hinge region 18. In this way the flexible base layer forms a hinge 18 that is easy to handle and does not spring back, while the stiff upper layer maintains the shape of the flap.

Abstract: This document provides multiblock copolymers comprising: at least one block obtained from a polyester having an average MN of from about 2,000 to about 200,000, wherein the polyester contains one or more terephthalate units; and at least one block obtained from a polyolefin having an average MN of from about 2,000 to about 200,000. This document further provides methods of making and using the multiblock copolymers, and multilayer films, polymer blends, and molded articles comprising the multiblock copolymers.

Abstract: A resin including up to 99.99 weight percent (wt. %) of a first polyolefin grafted with a functional group selected from an ethylenically unsaturated carboxylic acid, a carboxylic acid anhydride, an ester functional group or a combination thereof; and 0.01 to 3.0 wt. % of a tin oxide-based catalyst, where the resin includes 0.2 wt. % to 1.5 wt. % of the functional group from the first polyolefin, the wt. % based on a total weight of the resin. The first polyolefin can be selected from a polyethylene, a polypropylene, an ethylene/alpha-olefin copolymer, a propylene/alpha-olefin copolymer and combinations thereof. The tin oxide-based catalyst can be selected from dibutyltin oxide, dioctyltin oxide and combinations thereof. The resin can be used in a multilayer structure, where a Layer A comprises the resin and a Layer B comprises a polyester, where a first major surface of Layer A is in adhering contact with the second major surface of Layer B.

Abstract: A resealable flap device in the form of a sheet, for applying to or incorporating in packaging, comprises: a base layer 30 of flexible material, and an upper layer 40 of stiff material. The sheet is cut (15) through both layers to outline a flap portion 14, the cut leaving an edge in a hinge region 18, the upper layer being removed behind the line of the hinge region 18. In this way the flexible base layer forms a hinge 18 that is easy to handle and does not spring back, while the stiff upper layer maintains the shape of the flap.

Abstract: A resealable flap device in the form of a sheet, for applying to or incorporating in packaging, comprises: a base layer (30) of flexible material, and an upper layer (40) of stiff material. The sheet is cut (15) through both layers to outline a flap portion (14), the cut leaving an edge in a hinge region (18), the upper layer being removed behind the line of the hinge region (18). In this way the flexible base layer forms a hinge (18) that is easy to handle and does not spring back, while the stiff upper layer maintains the shape of the flap.

Abstract: The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

Abstract: Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.

Abstract: The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Abstract: A resealable flap device in the form of a sheet, for applying to or incorporating in packaging, comprises: a base layer (30) of flexible material, and an upper layer (40) of stiff material. The sheet is cut (15) through both layers to outline a flap portion (14), the cut leaving an edge in a hinge region (18), the upper layer being removed behind the line of the hinge region (18). In this way the flexible base layer forms a hinge (18) that is easy to handle and does not spring back, while the stiff upper layer maintains the shape of the flap.

Abstract: The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

Abstract: The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone.

Abstract: The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Abstract: Random copolymer top coats are described that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films.

Abstract: The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

Abstract: A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.

Abstract: The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Abstract: Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.