Patents by Inventor Christopher John Roach

Christopher John Roach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7943060
    Abstract: The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25° C. and 50-60% RH. For 24 to 48 hours or up to the time when weight gain (due to moisture absorption) stops increasing. An accelerated hydration process in a chamber with higher than normal humidity level (i.e. 50% Relative Humidity) is also applicable to shorten the time of exposure to fully hydrate the desiccant material.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: May 17, 2011
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Carl B. Wang, Christopher John Roach, Fong-Pei Chang
  • Patent number: 7691288
    Abstract: The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The present invention further relates to a getter composition utilizing low-softening temperature glasses comprising, based on weight %, 1-50% SiO2, 0-80% B2O3, 0-90% Bi2O3, 0-90% PbO, 0-90% P2O5, 0-60% Li2O, 0-30% Al2O3, 0-10% K2O, 0-10% Na2O, and 0-30% MO where M is selected from Ba, Sr, Ca, Zn, Cu, Mg and mixtures thereof. The glasses described herein may contain several other oxide constituents that can substitute glass network-forming elements or modify glass structure. The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25° C. and 50-60% RH. For 24 to 48 hours or up to the time when weight gain (due to moisture absorption) stops increasing.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: April 6, 2010
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Carl B. Wang, Christopher John Roach, Fong-Pei Chang
  • Patent number: 7645564
    Abstract: The invention is directed to a process and more particularly, to utilizing polymer solutions to make thick film compositions. In one embodiment the process is directed to the formation of photoimageable thick film compositions for use in photo-patterning methods to make photoimageable electrodes in flat panel display applications, including plasma display panels (PDP). Polymer solutions are obtained by directly polymerizing desired monomers in a desired solvent to form a desired polymer, rather than by dissolving a pre-made polymer in a desired solvent. Other ingredients are added to the polymer solution to directly form thick film pastes, including photoimageable thick film pastes.
    Type: Grant
    Filed: March 3, 2006
    Date of Patent: January 12, 2010
    Inventors: Haixin Yang, Pedro A. Jimenez, Cherng Y. Wang, Christopher John Roach, John Graeme Pepin, Michael F. Barker, Vincent Wen-Yuan Yeh
  • Publication number: 20090146110
    Abstract: This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.
    Type: Application
    Filed: February 11, 2009
    Publication date: June 11, 2009
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: ALAN FREDERICK CARROLL, Christopher John Roach, Che-Hsiung Hsu
  • Patent number: 7491442
    Abstract: This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: February 17, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alan Frederick Carroll, Christopher John Roach, Che-Hsiung Hsu
  • Patent number: 7282106
    Abstract: This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: October 16, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alan Frederick Carroll, Christopher John Roach, Che-Hsiung Hsu
  • Patent number: 7163596
    Abstract: This invention is directed to a process for the fabrication of features on a silicon wafer utilizing fibers or ribbons comprising organic polymer and inorganic material.
    Type: Grant
    Filed: May 2, 2003
    Date of Patent: January 16, 2007
    Assignee: E. I. du Pont Nemours and Company
    Inventors: Alan Frederick Carroll, Christopher John Roach, Che-Hsiung Hsu
  • Publication number: 20040009290
    Abstract: This invention is directed to a process for the fabrication of features on a silicon wafer utilizing fibers or ribbons comprising organic polymer and inorganic material.
    Type: Application
    Filed: May 2, 2003
    Publication date: January 15, 2004
    Inventors: Alan F. Carroll, Christopher John Roach