Patents by Inventor Christopher L. Aardahl
Christopher L. Aardahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090302269Abstract: New methods and compositions are disclosed that minimize foaming in hydrogen-releasing materials. Foaming can be minimized during release of hydrogen in composites that include structured forms such as wafers and discs. Change tolerances of from 0% to 25% in solid products described show promise for next-generation fuel elements and devices.Type: ApplicationFiled: June 2, 2009Publication date: December 10, 2009Applicant: BATTELLE MEMORIAL INSTITUTEInventors: Daiwon Choi, Abhijeet J. Karkamkar, S. Thomas Autrey, Christopher L. Aardahl
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Patent number: 7553547Abstract: Backfilled, self-assembled monolayers and methods of making the same are disclosed. The self-assembled monolayer comprises at least one functional organosilane species and a substantially random dispersion of at least one backfilling organosilane species among the functional organosilane species, wherein the functional and backfilling organosilane species have been sequentially deposited on a substrate. The method comprises depositing sequentially a first organosilane species followed by a backfilling organosilane species, and employing a relaxation agent before or during deposition of the backfilling organosilane species, wherein the first and backfilling organosilane species are substantially randomly dispersed on a substrate.Type: GrantFiled: December 21, 2005Date of Patent: June 30, 2009Assignee: Battelle Memorial InstituteInventors: Glen E. Fryxell, Thomas S. Zemanian, R. Shane Addleman, Christopher L. Aardahl, Feng Zheng, Brad Busche, Oleg B. Egorov
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Patent number: 7220396Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.Type: GrantFiled: January 13, 2003Date of Patent: May 22, 2007Assignee: Battelle Memorial InstituteInventors: Christopher L. Aardahl, Rick J. Orth, Kenneth G. Rappé, Delbert L. Lessor, Gary B. Josephson
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Patent number: 7160521Abstract: A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.Type: GrantFiled: January 13, 2003Date of Patent: January 9, 2007Assignee: Applied Materials, Inc.Inventors: Peter Porshnev, Sebastien Raoux, Mike Woolston, Christopher L. Aardahl, Rick J. Orth, Kenneth G. Rappe
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Patent number: 7081231Abstract: The present disclosure pertains to a system and method for treatment of oxygen rich exhaust and more specifically to a method and system that combines non-thermal plasma with a metal doped ?-alumina catalyst. Current catalyst systems for the treatment of oxygen rich exhaust are capable of achieving only approximately 7 to 12% NOx reduction as a passive system and only 25–40% reduction when a supplemental hydrocarbon reductant is injected into the exhaust stream. It has been found that treatment of an oxygen rich exhaust initially with a non-thermal plasma and followed by subsequent treatment with a metal doped ?-alumina prepared by the sol gel method is capable of increasing the NOx reduction to a level of approximately 90% in the absence of SO2 and 80% in the presence of 20 ppm of SO2. Especially useful metals have been found to be indium, gallium, and tin.Type: GrantFiled: November 8, 2000Date of Patent: July 25, 2006Assignees: Caterpillar Inc., Battelle Memorial InstituteInventors: Christopher L. Aardahl, Mari Lou Balmer-Miller, Ashok Chanda, Craig F. Habeger, Kent A. Koshkarian, Paul W. Park
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Patent number: 7011760Abstract: Carbon nanotube structures are disclosed in which nanotubes are disposed over a porous support such as a foam, felt, mesh, or membrane. Techniques of making these structures are also disclosed. In some of these techniques, a support is pretreated with a templated surfactant composition to assist with the formation of a nanotube layer.Type: GrantFiled: September 30, 2004Date of Patent: March 14, 2006Assignee: Battelle Memorial InstituteInventors: Yong Wang, Ya-Huei Chin, Yufei Gao, Christopher L. Aardahl, Terri L. Stewart
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Patent number: 6824689Abstract: Carbon nanotube structures are disclosed in which nanotubes are disposed over a porous support such as a foam, felt, mesh, or membrane. Techniques of making these structures are also disclosed. In some of these techniques, a support is pretreated with a templated surfactant composition to assist with the formation of a nanotube layer.Type: GrantFiled: December 24, 2001Date of Patent: November 30, 2004Assignee: Battelle Memorial InstituteInventors: Yong Wang, Ya-Huei Chin, Yufei Gao, Christopher L. Aardahl, Terri L. Stewart
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Publication number: 20040042947Abstract: A method for reducing NOx in a gas stream by sequentially exposing the gas stream to a first and a second catalyst. The first catalyst converts at least a portion of the gas stream to a reducing gas, it reduces at least a portion of the NOx in a first temperature range, and it absorbs at least a portion of the NOx in the first temperature range. The second catalyst reduces at least a portion of the NOx in a second temperature range utilizing the reducing gas produced by the second catalyst. The reducing gas produced by the first catalyst is typically a partially oxidized hydrocarbon, preferably an aldehyde, and more preferably acetaldehyde or formaldehyde. In addition to the first and second catalysts, the gas stream may be exposed to a plasma. Preferably, the first catalyst is selected as a zeolite, and more preferably a zeolite impregnated with a cation.Type: ApplicationFiled: August 26, 2003Publication date: March 4, 2004Inventors: John Hoard, Christopher L. Aardahl, Paul W. Park
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Publication number: 20040001787Abstract: A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.Type: ApplicationFiled: January 13, 2003Publication date: January 1, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Peter Porshnev, Sebastien Raoux, Mike Woolston, Christopher L. Aardahl, Rick J. Orth, Kenneth G. Rappe
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Patent number: 6660061Abstract: A vapor filtration device including a first electrode, a second electrode, and a filter between the first and second electrodes is disclosed. The filter is formed of dielectric material and the device is operated by applying a first electric potential between the electrodes to polarize the dielectric material such that upon passing a vapor stream through the filter, particles from the vapor stream are deposited onto the filter. After depositing the particles a second higher voltage is applied between the electrodes to form a nonthermal plasma around the filter to vaporize the collected particles thereby cleaning the filter. The filter can be a packed bed or serpentine filter mat, and an optional upstream corona wire can be utilized to charge airborne particles prior to their deposition on the filter.Type: GrantFiled: October 26, 2001Date of Patent: December 9, 2003Assignee: Battelle Memorial InstituteInventors: Gary B. Josephson, William O. Heath, Christopher L. Aardahl
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Publication number: 20030161774Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.Type: ApplicationFiled: January 13, 2003Publication date: August 28, 2003Applicant: Battelle Memorial InstituteInventors: Gary B. Josephson, Delbert L. Lessor, Kenneth G. Rappe, Rick J. Orth, Christopher L. Aardahl
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Publication number: 20030116503Abstract: Carbon nanotube structures are disclosed in which nanotubes are disposed over a porous support such as a foam, felt, mesh, or membrane. Techniques of making these structures are also disclosed. In some of these techniques, a support is pretreated with a templated surfactant composition to assist with the formation of a nanotube layer.Type: ApplicationFiled: December 24, 2001Publication date: June 26, 2003Inventors: Yong Wang, Ya-Huei Chin, Yufei Gao, Christopher L. Aardahl, Terri L. Stewart
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Publication number: 20030079982Abstract: A vapor filtration device comprising a first electrode, a second electrode, and a filter between the first and second electrodes is disclosed. The filter is formed of dielectric material and the device is operated by applying a first electric potential between the electrodes to polarize the dielectric material such that upon passing a vapor stream through the filter, particles from the vapor stream are deposited onto the filter. After depositing the particles a second higher voltage is applied between the electrodes to form a nonthermal plasma around the filter to vaporizing the collected particles thereby cleaning the filter. The filter is disclosed as either a packed bed or serpentine filter mat, and optionally an upstream corona wire is utilized to charge airborne particles prior to their deposition on the filter.Type: ApplicationFiled: October 26, 2001Publication date: May 1, 2003Inventors: Gary B. Josephson, William O. Heath, Christopher L. Aardahl