Abstract: An apparatus for wet chemical processing of multiple substrates consists of a processing tank that supports these substrates. Positioned within this tank, s flow plate is situated below the substrates when they are in place. This flow plate features numerous orifices that are configured to discharge a liquid solution containing a dispersion of gas bubbles towards the substrates.

Abstract: A semiconductor processing apparatus includes a process chamber that defines an enclosure. The enclosure includes a substrate support configured to support a substrate and rotate the substrate about a central axis of the process chamber. The substrate support is also configured to move vertically along the central axis and position the substrate at multiple locations in the enclosure. The apparatus also includes one or more UV lamps configured to irradiate a top surface of the substrate supported on the substrate support.

Abstract: An annealing system for a semiconductor substrate includes a process chamber having a central axis and one or more process zones. A carrier positioned in the process chamber may be configured to support the substrate during processing. One or more induction heaters may be positioned in the process chamber to heat the substrate during processing. The system may also include a removable cap with a heat shield. The cap may be configured to be inserted and removed from the process chamber through an opening on the process chamber wall. When the cap is used it may be coupled to the process chamber such that its heat shield is disposed above the substrate positioned on the carrier.

Abstract: An annealing system for semiconductor substrates includes a process chamber with multiple angularly arranged zones. A carrier rotates substrates between a first and second zone. An induction heater in the first zone heats the substrate, while a heat shield above the substrate, composed of thermally insulating material, controls temperature. The shield has a crown and rim, with one or more resistive heaters to adjust the rim's temperature relative to the temperature of the crown for improving uniformity of substrate temperature.

Abstract: A batch processing oven includes a processing chamber, a magnet, and a rack. The processing chamber includes a gas inlet on a first side and a gas outlet on a second side opposite the first side, the gas inlet is configured to direct a hot gas into the processing chamber and the gas outlet is configured to exhaust the convective energy in parallel with the radiative energy from the walls. The magnet is arranged such that its north pole will be formed on the first side of the processing chamber and its south pole will be formed on the second side of the processing chamber. The rack is configured to be positioned between the first and second ends of the processing chamber and is configured to support a plurality of vertically spaced-apart substrates.

Abstract: A method of thermally inhibiting starch or flour is provided. The method involves thermally or non-thermally dehydrating a grain to anhydrous or substantially anhydrous, and then heat treating this dehydrated grain. The heat treated dehydrated grain is then milled, producing thermally inhibited flour and/or starch. Using this method, the shelf life of the resulting thermally inhibited whole grain flour is extended compared whole grain flours that are thermally inhibited after milling.

Abstract: A method of thermally inhibiting starch or flour is provided. The method involves thermally or non-thermally dehydrating a grain to anhydrous or substantially anhydrous, and then heat treating this dehydrated grain. The heat treated dehydrated grain is then milled, producing thermally inhibited flour and/or starch. Using this method, the shelf life of the resulting thermally inhibited whole grain flour is extended compared whole grain flours that are thermally inhibited after milling. The foregoing methods applied to starch (following milling of the grain) resulted in starch whiter than obtainable using prior art methods.

Abstract: An oven with a processing chamber having an adjustable enclosed volume that is configured to support a substrate and includes a lamp assembly configured to heat the substrate. The oven also includes a sealing door that bounds one end of the processing chamber. The sealing door is configured to be moved from a first position to a second position to change the enclosed volume of the processing chamber from a first volume to a second volume.

Abstract: A method of improving interfacial adhesion of a copper-glass interface in a Through Glass Via (TGV) of an electronic device includes coating an internal wall of the TGV with a curable polymer material having a viscosity in its liquid phase less than 40 Poise. The coating is then cured to form a dielectric liner having a tensile strength greater than about 5 Mpa. After curing, a copper coating is applied on the dielectric liner.

Abstract: A batch processing oven includes a processing chamber, a magnet, and a rack. The processing chamber includes a gas inlet on a first side and a gas outlet on a second side opposite the first side, the gas inlet is configured to direct a hot gas into the processing chamber and the gas outlet is configured to exhaust the convective energy in parallel with the radiative energy from the walls. The magnet is arranged such that its north pole will be formed on the first side of the processing chamber and its south pole will be formed on the second side of the processing chamber. The rack is configured to be positioned between the first and second ends of the processing chamber and is configured to support a plurality of vertically spaced-apart substrates.

Abstract: Methods for regenerating spent catalysts, including spent catalysts used in in the catalytic conversion of a hydrocarbon feedstock. The method and associated processes comprising the method are useful to recover spent catalysts used in the petroleum and chemical processing industries. The method generally involves the use of an aqueous leaching solution to leach catalytically active metals from the spent catalyst so that solid carbon built up on the catalyst may be separated from the catalyst metals. The recovered catalyst metals, or a catalyst formed therefrom, may then be re-used in a catalytic conversion process.

Abstract: An apparatus for wet chemical processing includes a processing tank that configured to contain a liquid chemical composition and support a plurality of substrates in the liquid chemical composition. A flow plate may be disposed in the processing tank below the plurality of substrates. The flow plate may include a plurality of liquid nozzles configured to direct the liquid chemical composition into the tank and a plurality of gas outlets configured to direct a gas into the tank.

Abstract: This specification discloses a potato starch modified to have a narrow carboxylation and viscosity profile, and sulfite levels that are below detection levels by titration. The disclosed starch forms thermal-reversible gels having a fast gelling rate and that are useful in imitation cheese.

Abstract: A method of improving interfacial adhesion of a copper-glass interface in a Through Glass Via (TGV) of an electronic device includes coating an internal wall of a TGV with a curable polymer material having a viscosity less than 30 Poise. The coating is cured to form a dielectric liner having a tensile strength greater than about 8 Mpa and a dielectric loss less than about 0.002. A layer of copper may then be deposited on the dielectric liner.

Abstract: Improved thermally inhibited starch is disclosed and methods of making such starch are disclosed. In some embodiments a thermally inhibited starch has improved whiteness and flavor. In some embodiments a method for making a thermally inhibited starch includes providing adding a buffer and an acid to a starch to obtain a pH adjusted starch having an acidic pH and thermally inhibiting the pH adjusted starch. The technology further pertains to methods of making the thermally inhibited starch in batch, continuous, continuous-like process or combinations thereof.

Abstract: A coating removal apparatus includes multiple pairs of rotatable brushes spaced apart from each other in a first direction. Each pair of brushes may include two opposing brushes that are configured to rotate about a common axis and move towards and away from each other in a second direction transverse to the first direction. When a coated panel is positioned between the two opposing brushes, first portions of the brushes may separably engage with and rotate on opposite surfaces of the coated panel. The apparatus may also include one or more liquid tanks configured to contain a liquid. When the tanks contain the liquid and when the coated panel is positioned between the two opposing brushes, second portions of the two brushes may at least contact the liquid in the liquid tanks.

Abstract: A heating unit includes a base plate and a cover plate. A passage extends through base plate such that a conduit is defined between base plate and cover plate. A first set of heaters is disposed on a side of base plate opposite passage and a second set of heaters is disposed on a side of cover plate opposite passage.

Abstract: A semiconductor processing apparatus includes a process chamber that defines an enclosure. The enclosure includes a substrate support configured to support a substrate and rotate the substrate about a central axis of the process chamber. The substrate support is also configured to move vertically along the central axis and position the substrate at multiple locations in the enclosure. The apparatus also includes one or more UV lamps configured to irradiate a top surface of the substrate supported on the substrate support.

Abstract: A process of making a caramel color comprising a) mixing a carbohydrate with an ammonia compound and a sulfite compound and at pH from just greater than about 4.0 to about 6.0; and b) heating of the mixture from step a) in a sealed vessel to a temperature of from about 120° C. to about 137° C. and maintaining a temperature in said range for at least about 2 hours, said time and temperature being sufficient to yield a product having a color level of at least about double strength and a level of 4-MeI of less than about 20 ppm, is provided. Also provided is a process of ramped heating which results in a similar caramel color product.

Abstract: A batch processing oven includes a processing chamber, a magnet, and a rack. The processing chamber includes a gas inlet on a first side and a gas outlet on a second side opposite the first side, the gas inlet is configured to direct a hot gas into the processing chamber and the gas outlet is configured to exhaust the convective energy in parallel with the radiative energy from the walls. The magnet is arranged such that its north pole will be formed on the first side of the processing chamber and its south pole will be formed on the second side of the processing chamber. The rack is configured to be positioned between the first and second ends of the processing chamber and is configured to support a plurality of vertically spaced-apart substrates.