Patents by Inventor Christopher Lew

Christopher Lew has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140326611
    Abstract: Oxygen reduction catalysts for fuel cells are provided. The catalyst can be based on platinum-coated palladium nanotubes, or multiple twinned, crystalline silver nanowires. Also provided is a method of removing carbon dioxide using a membrane having basic functional groups, and a method of water electrolysis using a membrane having basic functional groups.
    Type: Application
    Filed: October 10, 2012
    Publication date: November 6, 2014
    Inventors: Yushan Yan, Christopher Lew, Qian Xu, Feng Wang, Shuang Gu, Wenchao Sheng, Shaun Alia, Laj Xiong
  • Publication number: 20130336432
    Abstract: Systems and methods are described for processing a digital signal. In one embodiment, the method comprises receiving time-aligned input samples of an input signal; computing at least one moment using the time-aligned input samples; determining at least one of signal energy per symbol and noise power spectral density based on the at least one moment; and adjusting an input signal level based on the at least one of the signal energy per symbol and the noise power spectral density.
    Type: Application
    Filed: June 19, 2012
    Publication date: December 19, 2013
    Applicant: GENERAL DYNAMICS C4 SYSTEMS, INC.
    Inventors: Randy Lee Turcotte, Christopher Lew Woodland, Nina Tina Murphy, Thomas Ohe
  • Publication number: 20100249445
    Abstract: A method of silylating porous silica films comprises: preparing a porous silica film; and grafting the film with a hydrophobic functional group while annealing the film. The porous silica film is a sol-gel silica film, a mesoporous silica film, in situ crystallized polycrystalline pure-silica zeolite (PSZ), spin-on PSZ, and spin-on PSZ MEL (or PSZ MEL-structural type) films. The hydrophobic functional group is trimethylchlorosilane (TMCS); dimethyldichlorosilane; methyltrichlorosilane; alkylchlorosilanes, such as (CH3(CH2)n)xSiCl4-x, where x is 1, 2, or 3; alkoxychlorosilanes; hexamethyldisilazane (HMDS), and/or aminosilanes. In addition, the steps of grafting and annealing the film are performed simultaneously, which imparts hydrofluoric acid resistance and reduces moisture adsorption to the film.
    Type: Application
    Filed: March 24, 2010
    Publication date: September 30, 2010
    Applicant: The Regents of the University of California
    Inventors: Yushan Yan, Christopher Lew