Patents by Inventor Christopher Lyle Aardahl

Christopher Lyle Aardahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Processes and apparatuses for treating halogen-containing gases
    Patent number: 7407635
    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
    Type: Grant
    Filed: December 16, 2003
    Date of Patent: August 5, 2008
    Assignee: Battelle Memorial Institute
    Inventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
  • Processes and apparatuses for treating halogen-containing gases
    Patent number: 6962679
    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: November 8, 2005
    Assignee: Battelle Memorial Institute
    Inventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
  • Processes and apparatuses for treating halogen-containing gases
    Publication number: 20040131524
    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
    Type: Application
    Filed: December 16, 2003
    Publication date: July 8, 2004
    Applicant: Battelle Memorial Institute
    Inventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
  • Processes and apparatuses for treating halogen-containing gases
    Publication number: 20030012718
    Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
    Type: Application
    Filed: July 11, 2001
    Publication date: January 16, 2003
    Applicant: Battelle Memorial Institute
    Inventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe