Patents by Inventor Christopher M. Scherpereel

Christopher M. Scherpereel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Diamond-like carbon films from a hydrocarbon helium plasma
    Patent number: 5569501
    Abstract: The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond-like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: October 29, 1996
    Assignee: International Business Machines Corporation
    Inventors: Fredric D. Bailey, Douglas A. Buchanan, Alessandro C. Callegari, Howard M. Clearfield, Fuad E. Doany, Donis G. Flagello, Harold J. Hovel, Douglas C. Latulipe, Jr., Naftali E. Lustig, Andrew T. S. Pomerene, Sampath Purushothaman, Christopher M. Scherpereel, David E. Seeger, Jane M. Shaw
  • Diamond-like carbon films from a hydrocarbon helium plasma
    Patent number: 5470661
    Abstract: The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
    Type: Grant
    Filed: January 7, 1993
    Date of Patent: November 28, 1995
    Assignee: International Business Machines Corporation
    Inventors: Fredric D. Bailey, Douglas A. Buchanan, Alessandro C. Callegari, Howard M. Clearfield, Fuad E. Doany, Donis G. Flagello, Harold J. Hovel, Douglas C. Latulipe, Jr., Naftali E. Lustig, Andrew T. S. Pomerene, Sampath Purushothaman, Christopher M. Scherpereel, David E. Seeger, Jane M. Shaw