Patents by Inventor Christopher Michael Lee

Christopher Michael Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11545270
    Abstract: A dossier change control management system periodically ingests data regarding a regulated product from multiple data stores. The dossier change control management system updates dossier data describing a dossier history for the regulated product using the received data. The dossier includes multiple documents in a standardized format and is updated based on a data mapping indicating correspondence between fields of the documents and portions of the received data. An out-of-expectation scenario for the dossier is identified based on regulatory requirements and an alert generated. A report with information about the out-of-expectation scenario is provided for display at a client device based on the alert.
    Type: Grant
    Filed: January 21, 2020
    Date of Patent: January 3, 2023
    Assignee: Merck Sharp & Dohme Corp.
    Inventors: Christina Elizabeth Frey, Andrew Hakfan Chen, Christopher Michael Lee, Nirdosh Jagota
  • Patent number: 11072867
    Abstract: Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.
    Type: Grant
    Filed: October 3, 2017
    Date of Patent: July 27, 2021
    Assignee: CITY UNIVERSITY OF HONG KONG
    Inventors: Christopher Michael Lee, Yang Yang Li, Jian Lu
  • Publication number: 20180030609
    Abstract: Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.
    Type: Application
    Filed: October 3, 2017
    Publication date: February 1, 2018
    Inventors: Christopher Michael Lee, Yang Yang Li, Jian Lu