Patents by Inventor Christopher N. Bowman

Christopher N. Bowman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160039961
    Abstract: The present invention includes microspheres prepared using step-growth dispersion click chemistry polymerization. In certain embodiments, the click chemistry polymerization comprises thiol-ene polymerization and/or thiol-Michael polymerization. In other embodiments, the microspheres are near-monodisperse and/or monodisperse. In yet other embodiments, the microspheres have a glass transition temperature (Tg) in the range of ?50° C. to 100° C. The present invention further includes a method of making the same.
    Type: Application
    Filed: July 31, 2015
    Publication date: February 11, 2016
    Inventors: CHRISTOPHER N. BOWMAN, CHEN WANG
  • Patent number: 9193682
    Abstract: Monomers having a C-B-A-B-C structure are disclosed, where A is a core of either trithiocarbonate and allyl sulfide, where B are linker units, and where C are end units. The end units may comprise acrylates, methacrylates, alcohol(s), amine(s), and alkynes, among others. The linker units may include an alkane, alkene, phenyl, diphenyl, or benzylic group, among others. Methods of synthesizing such compounds are also disclosed.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: November 24, 2015
    Inventors: Christopher R Fenoli, Christopher N Bowman
  • Publication number: 20150267002
    Abstract: The present invention includes compositions comprising an alkyne-based substrate, an azide-based substrate, optionally a Cu(II) salt and optionally a photoinducible reducing agent. The present invention further includes a method of preparing composite materials that are suitable for use as dental implants using the compositions of the invention.
    Type: Application
    Filed: March 19, 2015
    Publication date: September 24, 2015
    Inventors: CHRISTOPHER N. BOWMAN, CHRISTOPHER J. KLOXIN, JEFFREY STANSBURY, TAO GONG, MATTHEW McBRIDE
  • Publication number: 20150250687
    Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer, and optionally an isocyanate monomer. The invention further includes a composition comprising a composition comprising the tetra(2-mercapto)silane (SiTSH) monomer and at least one selected from the group consisting of (a) a Michael acceptor, optionally an isocyanate monomer, and optionally at least one catalyst selected from the group consisting of a base, nucleophile, photolabile base, photolabile nucleophile, and mixtures thereof; (b) an ene monomer, and optionally a polymerization photoinitiator. In certain embodiments, once the composition is polymerized, the polymerized system is suitable for use as a dental composite system. In other embodiments, the polymerized system is stable to acidic and basic conditions. In yet other embodiments, the polymerized system forms microparticles. The invention further includes a method of generating a dental polymeric material.
    Type: Application
    Filed: March 6, 2015
    Publication date: September 10, 2015
    Inventors: CHRISTOPHER N. BOWMAN, WEIXIAN XI, SHUNSUKE CHATANI, TAO GONG, DEVATHA P. NAIR, MACIEJ PODGORSKI
  • Publication number: 20150057187
    Abstract: Click nucleic acid monomers and polymers containing such monomers are disclosed. The click nucleic acid monomers include an optionally protected thiol moiety, an optionally protected thiol-click acceptor moiety, and an optionally protected nucleobase (NB), which in some examples is an A, G, T, U, or C nucleobase. In some examples, the click nucleic acid monomer includes a N-vinyl thiol acetamide (VTA) backbone. In other examples the click nucleic acid monomer includes a N-vinyl thiol ethylamine (VTE) backbone. Methods of using such polymers, for example in place of naturally occurring nucleic acid polymer applications, such as DNA or RNA, and synthetic nucleic acid polymer applications, such as PNA or morpholino nucleic acids, are also disclosed.
    Type: Application
    Filed: March 12, 2013
    Publication date: February 26, 2015
    Inventors: Christopher N. Bowman, Christopher J. Kloxin, Weixian Xi
  • Patent number: 8962709
    Abstract: The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
    Type: Grant
    Filed: January 7, 2013
    Date of Patent: February 24, 2015
    Assignee: The Regents of the University of Colorado, a Body Corporate
    Inventors: Christopher N. Bowman, Neil B. Cramer
  • Publication number: 20150031782
    Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer and an acrylate monomer. In one embodiment, the thiol monomer reacts with the vinyl sulfone monomer preferentially over the acrylate monomer, and this differential selectivity allows for the control of the architecture of crosslinking polymer network. The invention further includes a composition comprising an electrophilic monomer, a nucleophilic monomer, a nucleophilic catalyst and an acid, wherein the concentrations of the nucleophilic catalyst and acid are selected as to provide a specific induction time for the polymerization reaction of the composition.
    Type: Application
    Filed: July 25, 2014
    Publication date: January 29, 2015
    Inventors: Christopher N. BOWMAN, Devatha P. NAIR, Maciej PODGORSKI, Shunsuke CHATANI
  • Patent number: 8877830
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material or during polymerization of a polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides mixtures for making crosslinked polymeric materials, methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention. The mixtures of the invention may be dental restorative compositions used for forming dental restorative materials.
    Type: Grant
    Filed: January 5, 2012
    Date of Patent: November 4, 2014
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventors: Christopher N. Bowman, Christopher Kloxin, Hee Young Park, Diana Leung
  • Publication number: 20140303391
    Abstract: Monomers having a C-B-A-B-C structure are disclosed, where A is a core of either trithiocarbonate and allyl sulfide, where B are linker units, and where C are end units. The end units may comprise acrylates, methacrylates, alcohol(s), amine(s), and alkynes, among others. The linker units may include an alkane, alkene, phenyl, diphenyl, or benzylic group, among others. Methods of synthesizing such compounds are also disclosed.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 9, 2014
    Inventors: Christopher R. Fenoli, Christopher N. Bowman
  • Patent number: 8727775
    Abstract: The present invention provides polymerizable dental compositions comprising a dimer acid-derived monomer such as a dimer acid-derived di(meth)acrylate monomer.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: May 20, 2014
    Assignee: The Regents of the University of Colorado, a Body Corporate
    Inventors: Jeffrey W. Stansbury, Christopher N. Bowman, Marianela Trujillo
  • Patent number: 8697346
    Abstract: Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
    Type: Grant
    Filed: April 1, 2011
    Date of Patent: April 15, 2014
    Assignee: The Regents of the University of Colorado
    Inventors: Robert R. McLeod, Christopher N. Bowman, Timothy F. Scott, Amy C. Sulivan
  • Patent number: 8652778
    Abstract: The invention provides methods to detect molecular recognition events. The invention also provides methods to detect the presence of or identify a target species based on its interaction with one or more probe species. The methods of the invention are based on amplification of the signal due to each molecular recognition event. The amplification is achieved through photopolymerization, with the polymer formed being associated with the molecular recognition event. In one aspect, a fluorescent polymer, a magnetic polymer, a radioactive polymer or an electrically conducting polymer can form the basis of detection and amplification. In another aspect, a polymer gel swollen with a fluorescent solution, a magnetic solution, a radioactive solution or an electrically conducting solution can form the basis of detection and amplification. In another aspect, detectable particles can be included in the polymer formed. In another aspect, sufficient polymer forms to be detectable by visual inspection.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: February 18, 2014
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventors: Christopher N. Bowman, Kathy Rowlen, Hadley Sikes, Ryan Hansen, Heather Jean Avens
  • Patent number: 8455565
    Abstract: Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: June 4, 2013
    Assignees: 3M Innovative Properties Company, The Regents of the University of Colorado
    Inventors: Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang, Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin
  • Patent number: 8431626
    Abstract: Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: April 30, 2013
    Assignees: 3M Innovative Properties Company, The Regents of the University of Colorado
    Inventors: Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin, Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang
  • Patent number: 8404758
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: May 17, 2011
    Date of Patent: March 26, 2013
    Assignee: The Regents of the University of Colorado, a body corporate
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Publication number: 20120295227
    Abstract: Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.
    Type: Application
    Filed: May 18, 2011
    Publication date: November 22, 2012
    Inventors: Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin, Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang
  • Publication number: 20120295228
    Abstract: Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.
    Type: Application
    Filed: May 18, 2011
    Publication date: November 22, 2012
    Inventors: Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang, Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin
  • Publication number: 20120256338
    Abstract: The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
    Type: Application
    Filed: May 16, 2012
    Publication date: October 11, 2012
    Applicant: The Regents of the University of Colorado, a body corporate
    Inventors: Christopher N. Bowman, Neil B. Cramer
  • Publication number: 20120202917
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material or during polymerization of a polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides mixtures for making crosslinked polymeric materials, methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention. The mixtures of the invention may be dental restorative compositions used for forming dental restorative materials.
    Type: Application
    Filed: January 5, 2012
    Publication date: August 9, 2012
    Inventors: Christopher N. Bowman, Christopher Kloxin, Hee Young Park, Diana Leung
  • Patent number: 8192673
    Abstract: The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: June 5, 2012
    Assignee: University of Kansas
    Inventors: Christopher N. Bowman, Neil B. Cramer