Patents by Inventor Christopher Olson

Christopher Olson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing method and apparatus with control of rf bias
    Patent number: 6265831
    Abstract: A tendency for a discontinuity to occur in the amount of power reflected back to an r.f. bias source of a vacuum plasma processor is overcome by controlling the r.f. bias source output power so the power delivered to plasma in a vacuum processing chamber remains substantially constant. The r.f bias source output power is changed much faster than changes in capacitors of a matching network connecting the r.f. bias power source to an electrode of a workpiece holder processor. A capacitive impedance component of the plasma is determined by optically measuring the thickness of a plasma sheath in the chamber.
    Type: Grant
    Filed: March 31, 1999
    Date of Patent: July 24, 2001
    Assignee: Lam Research Corporation
    Inventors: Arthur M. Howald, John P. Holland, Christopher Olson