Patents by Inventor Christopher Pickering

Christopher Pickering has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240141360
    Abstract: An isolated or purified AON for modifying pre-mRNA splicing in the Receptor for Advanced Glycation End-products (RAGE) to modulate splicing of the RAGE gene transcript or part thereof is provided.
    Type: Application
    Filed: May 1, 2023
    Publication date: May 2, 2024
    Applicants: MONASH UNIVERSITY, MURDOCH UNIVERSITY
    Inventors: Stephen WILTON, Merlin Christopher THOMAS, Carlos ROSADO, Raelene Jane PICKERING
  • Patent number: 6726767
    Abstract: Layer processing to grow a layer structure upon a substrate surface comprises supplying a vapor mixture stream to the substrate (28) to deposit constituents, monitoring growth with an ellipsometer (12) and using its output in real-time growth control of successive pseudo-layers. A Bayesian algorithm is used to predict a probability density function for pseudo-layer growth parameters from initial surface composition, growth conditions and associated growth probabilities therewith, the function comprising discrete samples. Weights are assigned to the samples representing occurrence likelihoods based on most recent sensor output. A subset of the samples is chosen with selection likelihood weighted in favor of samples with greater weights. The subset provides a subsequent predicted probability density function and associated pseudo-layer growth parameters for growth control, and becomes a predicted probability density function for a further iteration of pseudo-layer growth.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: April 27, 2004
    Assignee: QinetiQ Limited
    Inventors: Alan D Marrs, Allister W. E. Dann, John L Glasper, Christopher Pickering, David J Robbins, John Russell
  • Patent number: 6362881
    Abstract: A method of monitoring material parameters of a sample (4) (for example electrical properties of a semiconductor) during processing (for example during manufacture) which uses ellipsometric techniques to study the changes induced in the ellipsometric spectra of the material, by modulation of the internal electric field of the material, and determining from these changes the material parameters of interest The means of modulation can be a source of electromagnetic radiation, for example a laser (8). The ellipsometer used may include an array of photodetectors. The process allows the real time monitoring of the process under examination.
    Type: Grant
    Filed: May 10, 1999
    Date of Patent: March 26, 2002
    Assignee: The Secretary of State for Defence
    Inventors: Christopher Pickering, Roger T Carline