Patents by Inventor Christopher Sears

Christopher Sears has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220054647
    Abstract: Conjugates of an active agent such as DM1 attached to a targeting moiety, such as a somatostatin receptor binding moiety, via a linker, and particles comprising such conjugates have been designed. Such conjugates and particles can provide improved temporospatial delivery of the active agent, improved biodistribution and penetration in tumor, and/or decreased toxicity. Methods of making the conjugates, the particles, and the formulations thereof are provided. Methods of administering the formulations to a subject in need thereof are provided, for example, to treat or prevent cancer.
    Type: Application
    Filed: November 4, 2021
    Publication date: February 24, 2022
    Inventors: Rajesh R. Shinde, Rossitza G. Alargova, Patrick Lim Soo, Beata Sweryda-Krawiec, Leila Alland, Christopher Sears
  • Patent number: 11213590
    Abstract: Conjugates of an active agent such as DM1 attached to a targeting moiety, such as a somatostatin receptor binding moiety, via a linker, and particles comprising such conjugates have been designed. Such conjugates and particles can provide improved temporospatial delivery of the active agent, improved biodistribution and penetration in tumor, and/or decreased toxicity. Methods of making the conjugates, the particles, and the formulations thereof are provided. Methods of administering the formulations to a subject in need thereof are provided, for example, to treat or prevent cancer.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: January 4, 2022
    Assignee: TARVEDA THERAPEUTICS, INC.
    Inventors: Rajesh R. Shinde, Rossitza G. Alargova, Patrick Lim Soo, Beata Sweryda-Krawiec, Leila Alland, Christopher Sears
  • Publication number: 20210327770
    Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.
    Type: Application
    Filed: April 7, 2021
    Publication date: October 21, 2021
    Inventors: Xinrong Jiang, Christopher Sears
  • Patent number: 11087950
    Abstract: Systems and methods to focus and align multiple electron beams are disclosed. A camera produces image data of light from electron beams that is projected at a fiber optics array with multiple targets. An image processing module determines an adjustment to a voltage applied to a relay lens, a field lens, or a multi-pole array based on the image data. The adjustment minimizes at least one of a displacement, a defocus, or an aberration of one of the electron beams. Using a control module, the voltage is applied to the relay lens, the field lens, or the multi-pole array.
    Type: Grant
    Filed: August 27, 2018
    Date of Patent: August 10, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Christopher Sears, Luca Grella
  • Patent number: 11056312
    Abstract: A system is disclosed. In embodiments, the system includes an electron source and a micro-lens array (MLA) configured to receive one or more primary electron beams from the electron source and split the one or more primary electron beams into a plurality of primary electron beamlets. In embodiments, the system further includes a micro-stigmator array (MSA) including a plurality of dodecapole electrostatic stigmators, wherein the MSA is configured to eliminate at least one of fourth-order focusing aberrations or sixth-order focusing aberrations of the plurality of primary electron beamlets. In embodiments, the system further includes projection optics configured to receive the plurality of primary electron beamlets and focus the plurality of primary electron beamlets onto a surface of a sample.
    Type: Grant
    Filed: February 5, 2020
    Date of Patent: July 6, 2021
    Assignee: KLA Corporation
    Inventors: Xinrong Jiang, Christopher Sears
  • Patent number: 11037753
    Abstract: A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: June 15, 2021
    Assignee: KLA Corporation
    Inventor: Christopher Sears
  • Publication number: 20210169871
    Abstract: The present invention provides improved formulation with reduced tert-butanol levels and/or manufacturing process for drug compounds that form a solvate with tert-butanol. For example, the drug compound may be SDC-TRAP-0063.
    Type: Application
    Filed: April 3, 2019
    Publication date: June 10, 2021
    Applicant: Tarveda Therapeutics, Inc.
    Inventors: Mark T. BILODEAU, Eugene ZHOROV, Rajesh R. SHINDE, Christopher SEARS, Samantha BRADY, Beata SWERYDA-KRAWIEC
  • Publication number: 20210103996
    Abstract: A method begins by a computing device allocating a plurality of tasks of an agricultural prescription for a farming geographic area to a fleet of farming equipment. While executing tasks of the plurality of tasks, the method continues with at least some of the fleet of farming equipment collecting task execution data. Based on the task execution data, the method continues with the computing device updating at least one of the agricultural prescription, the plurality of tasks, and the allocation of at least one task of the plurality of tasks.
    Type: Application
    Filed: November 30, 2020
    Publication date: April 8, 2021
    Inventors: Craig Eugene Rupp, A. Corbett S. Kull, Christopher Sears Mikelson, Patrick Lee Dumstorff
  • Patent number: 10964522
    Abstract: A high-resolution electron energy analyzer is disclosed. In one embodiment, the electron energy analyzer includes an electrostatic lens configured to generate an energy-analyzing field region, decelerate electrons of an electron beam generated by an electron source, and direct the decelerated electrons of the electron beam to the energy-analyzing field region. In another embodiment, the electron energy analyzer includes an electron detector configured to receive one or more electrons passed through the energy-analyzing field region. In another embodiment, the electron detector is further configured to generate one or more signals based on the one or more received electrons.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: March 30, 2021
    Assignee: KLA Corporation
    Inventors: Xinrong Jiang, Christopher Sears, Nikolai Chubun
  • Patent number: 10853894
    Abstract: A method begins by a computing device allocating a plurality of tasks of an agricultural prescription for a farming geographic area to a fleet of farming equipment. While executing tasks of the plurality of tasks, the method continues with at least some of the fleet of farming equipment collecting task execution data. Based on the task execution data, the method continues with the computing device updating at least one of the agricultural prescription, the plurality of tasks, and the allocation of at least one task of the plurality of tasks.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: December 1, 2020
    Assignee: THE CLIMATE CORPORATION
    Inventors: Craig Eugene Rupp, A. Corbett S. Kull, Christopher Sears Mikelson, Patrick Lee Dumstorff
  • Patent number: 10790114
    Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: September 29, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Ichiro Honjo, Christopher Sears, Hedong Yang, Thanh Ha, Jianwei Wang, Huina Xu
  • Publication number: 20200281934
    Abstract: Conjugates of an active agent such as DM1 attached to a targeting moiety, such as a somatostatin receptor binding moiety, via a linker, have been designed. Methods of administering the conjugates to a subject in need thereof are provided, for example, to treat or prevent cancer.
    Type: Application
    Filed: October 26, 2018
    Publication date: September 10, 2020
    Inventors: Rajesh R. Shinde, Rossitza G. Alargova, Patrick Lim Soo, Beata Sweryda-Krawiec, Leila Alland, Christopher Sears
  • Patent number: 10770258
    Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: September 8, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Xinrong Jiang, Christopher Sears, Harsh Sinha, David Trease, David Kaz, Wei Ye
  • Patent number: 10748739
    Abstract: An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: August 18, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Xinrong Jiang, Christopher Sears
  • Publication number: 20200230126
    Abstract: The present invention provides pharmacological compounds including an effector moiety conjugated to a binding moiety that directs the effector moiety to a biological target of interest. Likewise, the present invention provides compositions, kits, and methods (e.g., therapeutic, diagnostic, and imaging) including the compounds. The compounds can be described as a protein interacting binding moiety-drug conjugate (SDC-TRAP) compounds, which include a protein interacting binding moiety and an effector moiety. For example, in certain embodiments directed to treating cancer, the SDC-TRAP can include an Hsp90 inhibitor conjugated to a cytotoxic agent as the effector moiety.
    Type: Application
    Filed: June 19, 2018
    Publication date: July 23, 2020
    Inventors: Leila Alland, Christopher Sears, Rajesh R. Shinde, Beata Sweryda-Krawiec, Tsun P. Au Yeung, Mark T. Bilodeau, Sudhakar Kadiyala, Eugene Zhorov, Richard Wooster
  • Publication number: 20200194224
    Abstract: Embodiments may include methods, systems, and apparatuses for correcting a response function of an electron beam tool. The correcting may include modulating an electron beam parameter having a frequency; emitting an electron beam based on the electron beam parameter towards a specimen, thereby scattering electrons, wherein the electron beam is described by a source wave function having a source phase and a landing angle; detecting a portion of the scattered electrons at an electron detector, thereby yielding electron data including an electron wave function having an electron phase and an electron landing angle; determining, using a processor, a phase delay between the source phase and the electron phase, thereby yielding a latency; and correcting, using the processor, the response function of the electron beam tool using the latency and a difference between the source wave function and the electron wave function.
    Type: Application
    Filed: November 22, 2019
    Publication date: June 18, 2020
    Inventors: Henning Stoschus, Stefan Eyring, Christopher Sears
  • Publication number: 20200194223
    Abstract: A scanning electron microscopy system may include an electron-optical sub-system and a controller. The electron-optical sub-system may include an electron source and an electron-optical column configured to direct an electron beam to a sample. The electron-optical column may include a double-lens assembly, a beam limiting aperture disposed between a first and second lens of the double-lens assembly, and a detector assembly configured to detect electrons scattered from the sample. In embodiments, the controller of the scanning electron microscopy system may be configured to: cause the electron-optical sub-system to form a flooding electron beam and perform flooding scans of the sample with the flooding electron beam; cause the electron-optical sub-system to form an imaging electron beam and perform imaging scans of the sample with the imaging electron beam; receive images acquired by the detector assembly during the imaging scans; and determine characteristics of the sample based on the images.
    Type: Application
    Filed: November 27, 2019
    Publication date: June 18, 2020
    Inventors: Xinrong Jiang, Christopher Sears
  • Publication number: 20200118784
    Abstract: An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.
    Type: Application
    Filed: December 21, 2018
    Publication date: April 16, 2020
    Inventors: Xinrong Jiang, Christopher Sears
  • Patent number: 10575353
    Abstract: A protective connector includes a core assembly structure, mating pins and a mating coupling structure. The core assembly structure has circuitry mounted therein. The mating coupling structure substantially encases the core assembly structure and mates with another connector such that the mating pins of the protective connector are electrically coupled to pins of the other connector. The mating coupling structure is mechanically free-moving with respect to the core assembly structure such that forces applied to the mating coupling structure to mate the protective connector to the other connector are not applied to the circuitry within the core assembly structure.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: February 25, 2020
    Assignee: The Climate Corporation
    Inventors: Christopher Sears Mikelson, Chad Plattner
  • Publication number: 20200013579
    Abstract: A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.
    Type: Application
    Filed: June 24, 2019
    Publication date: January 9, 2020
    Inventor: Christopher Sears