Abstract: An apparatus for locating a measurand anomaly, such as a hot-spot, along an optical waveguide is provided having: an optical waveguide, a light source configured to transmit light along the waveguide and a plurality of sensors provided along the waveguide. Each sensor is configured to reflect a portion of light propagating along the waveguide at a respective sensor wavelength corresponding to a measurand. The plurality of sensors is configured into one or more sets according to their sensor wavelengths, each set comprising a plurality of sensors with respective sensor wavelengths, wherein the sensors are configured such that the sensor wavelength for each sensor in a respective set is substantially equal when the measurand experienced by each of the sensors in that set is equal. The apparatus further includes a detector configured to monitor the light reflected by the sensors, and a control system.

Abstract: A monitoring probe is for monitoring a fluid inside a process system. The probe has a first portion comprising a plurality of optical sensors provided along a waveguide for monitoring a plurality of measurands from the fluid, wherein each optical sensor is configured to monitor at least one measurand from the fluid. The first portion of the probe is elongate and is configured to be inserted through an aperture of the process system into a chamber of the process system such that the optical sensors are in communication with the fluid. The probe further has an attachment element for securing the probe to the process system.

Abstract: An apparatus for locating a measurand anomaly, such as a hot-spot, along an optical waveguide is provided having: an optical waveguide, a light source configured to transmit light along the waveguide and a plurality of sensors provided along the waveguide. Each sensor is configured to reflect a portion of light propagating along the waveguide at a respective sensor wavelength corresponding to a measurand. The plurality of sensors is configured into one or more sets according to their sensor wavelengths, each set comprising a plurality of sensors with respective sensor wavelengths, wherein the sensors are configured such that the sensor wavelength for each sensor in a respective set is substantially equal when the measurand experienced by each of the sensors in that set is equal. The apparatus further includes a detector configured to monitor the light reflected by the sensors, and a control system.

Abstract: A monitoring probe is for monitoring a fluid inside a process system. The probe has a first portion comprising a plurality of optical sensors provided along a waveguide for monitoring a plurality of measurands from the fluid, wherein each optical sensor is configured to monitor at least one measurand from the fluid. The first portion of the probe is elongate and is configured to be inserted through an aperture of the process system into a chamber of the process system such that the optical sensors are in communication with the fluid. The probe further has an attachment element for securing the probe to the process system.