Abstract: Base platforms customizable into ICs are designed by identifying a plurality of macros for placement on the platform, each macro being defined in part by a plurality of elements that perform respective functions of the macro. Identical elements in a plurality of macros are identified, and a common element is placed on the platform for an identical element of at least two macros. All other elements of the macros are placed at locations on the platform relative to the common element as to satisfy macro placement rules for each macro. Identical elements can be identified by identifying similar elements in a plurality of macros, and creating a common element generic to the similar elements. The user designs a metalization layer to select macros and configure common elements to the selected macros.

Abstract: A method and apparatus are provided for placing cells in an integrated circuit layout pattern. A base layer layout pattern defines an array of base cell locations and base layer elements, wherein at least portions of some rows in the array are reserved for decoupling capacitor cells. Each decoupling capacitor cell has a width, which is greater than that of a single base cell location and which is abstracted from the base layer layout pattern. A cell library defines a plurality of cells, including a macro cell having open rows consistent with the rows in the base layer layout pattern that are reserved for the decoupling capacitor cells. The width of each decoupling capacitor cell is abstracted from the macro cell. Cells from the cell library, including the macro cell, are placed within a design layout pattern relative to the base layer layout pattern. An area consumed by the macro cell within the design layout pattern is independent of the width of the decoupling capacitor cells.