Abstract: Systems and methods for generating X-ray photons. The methods comprise: generating an electron beam; positioning hollow pedestals in the path of the electron beam (the hollow pedestals being radially spaced apart from each other and extending out and away from a major planar face of a base plate); generating X-ray radiation as a result of an interaction of the electron beam with target element(s) disposed at a distal end of a respective pedestal of the hollow pedestals; causing the X-ray radiation to interact with a beam shield comprising wall elements extending out and away from the major planar face of the base plate; and setting at least one of a beam shape and direction of the X-ray radiation by selectively controlling a location where the electron beam intersects the target element(s) to determine an interaction of the X-ray radiation with the wall elements.

Abstract: Systems and methods for generating X-ray photons. The methods comprise: generating an electron beam; positioning hollow pedestals in the path of the electron beam (the hollow pedestals being radially spaced apart from each other and extending out and away from a major planar face of a base plate); generating X-ray radiation as a result of an interaction of the electron beam with target element(s) disposed at a distal end of a respective pedestal of the hollow pedestals; causing the X-ray radiation to interact with a beam shield comprising wall elements extending out and away from the major planar face of the base plate; and setting at least one of a beam shape and direction of the X-ray radiation by selectively controlling a location where the electron beam intersects the target element(s) to determine an interaction of the X-ray radiation with the wall elements.

Abstract: Systems and methods for generating X-ray photons. The methods comprise: generating an electron beam; positioning hollow pedestals in the path of the electron beam (the hollow pedestals being radially spaced apart from each other and extending out and away from a major planar face of a base plate); generating X-ray radiation as a result of an interaction of the electron beam with target element(s) disposed at a distal end of a respective pedestal of the hollow pedestals; causing the X-ray radiation to interact with a beam shield comprising wall elements extending out and away from the major planar face of the base plate; and setting at least one of a beam shape and direction of the X-ray radiation by selectively controlling a location where the electron beam intersects the target element(s) to determine an interaction of the X-ray radiation with the wall elements.

Abstract: X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.

Abstract: Validation of a therapeutic radiation treatment involves using an applicator balloon surrounding an X-ray radiation source to support a plurality of X-ray sensor elements (XRSE). The XRSE are supported on the applicator balloon at distributed locations to sense applied radiation from the radiation source. At least one parameter of the applied radiation which has been sensed by the XRSE is compared to a corresponding parameter of a predetermined radiation treatment plan. Based on the comparing, a determination is made as to whether one or more requirements of the predetermined radiation treatment plan have been satisfied.

Abstract: X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.

Abstract: X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.

Abstract: X-ray target element is comprised of a planar wafer. The planar wafer element includes a target layer and a substrate layer. The target layer is comprised of an element having a relatively high atomic number and the substrate layer is comprised of diamond. The substrate layer is configured to support the target layer and facilitate transfer of thermal energy away from the target layer.

Abstract: Three dimensional beam forming X-ray source includes an electron beam generator (EBG) to generate an electron beam. A target element is disposed a predetermined distance from the EBG and positioned to intercept the electron beam. The target element is responsive to the electron beam to generate X-ray radiation. A beam former is disposed proximate to the target element and comprised of a material which interacts with the X-ray radiation to form an X-ray beam. An EBG control system controls at least one of a beam pattern and a direction of the X-ray beam by selectively varying a location where the electron beam intersects the target element to control an interaction of the X-ray radiation with the beam-former.

Abstract: Validation of a therapeutic radiation treatment involves using an applicator balloon surrounding an X-ray radiation source to support a plurality of X-ray sensor elements (XRSE). The XRSE are supported on the applicator balloon at distributed locations to sense applied radiation from the radiation source. At least one parameter of the applied radiation which has been sensed by the XRSE is compared to a corresponding parameter of a predetermined radiation treatment plan. Based on the comparing, a determination is made as to whether one or more requirements of the predetermined radiation treatment plan have been satisfied.

Abstract: Three dimensional beam forming X-ray source includes an electron beam generator (EBG) to generate an electron beam. A target element is disposed a predetermined distance from the EBG and positioned to intercept the electron beam. The target element is responsive to the electron beam to generate X-ray radiation. A beam former is disposed proximate to the target element and comprised of a material which interacts with the X-ray radiation to form an X-ray beam. An EBG control system controls at least one of a beam pattern and a direction of the X-ray beam by selectively varying a location where the electron beam intersects the target element to control an interaction of the X-ray radiation with the beam-former.