Patents by Inventor Christopher Waskiewicz

Christopher Waskiewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11113533
    Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: September 7, 2021
    Assignee: International Business Machines Corporation
    Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
  • Patent number: 10825916
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.
    Type: Grant
    Filed: January 19, 2020
    Date of Patent: November 3, 2020
    Assignee: International Business Machines Corporation
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20200152766
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.
    Type: Application
    Filed: January 19, 2020
    Publication date: May 14, 2020
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Patent number: 10566414
    Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: February 18, 2020
    Assignee: International Business Machines Corporation
    Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
  • Patent number: 10559672
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.
    Type: Grant
    Filed: January 20, 2019
    Date of Patent: February 11, 2020
    Assignee: International Business Machines Corporation
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Patent number: 10559671
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.
    Type: Grant
    Filed: May 6, 2019
    Date of Patent: February 11, 2020
    Assignee: International Business Machines Corporation
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20200026924
    Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 23, 2020
    Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
  • Patent number: 10528817
    Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.
    Type: Grant
    Filed: December 12, 2017
    Date of Patent: January 7, 2020
    Assignee: International Business Machines Corporation
    Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
  • Patent number: 10475878
    Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: November 12, 2019
    Assignee: International Business Machines Corporation
    Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
  • Publication number: 20190259854
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.
    Type: Application
    Filed: May 6, 2019
    Publication date: August 22, 2019
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20190180106
    Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.
    Type: Application
    Filed: December 12, 2017
    Publication date: June 13, 2019
    Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
  • Patent number: 10319833
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: June 11, 2019
    Assignee: International Business Machines Corporation
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20190167226
    Abstract: An infant gastrointestinal monitor and a method for infant gastrointestinal monitoring are provided. The infant gastrointestinal monitor includes a belly band for placing around at least a midsection area of a subject infant. The infant gastrointestinal monitor further includes a plurality of wireless sound sensors, integrated with the belly band in an array configuration, for identifying a location of a gastrointestinal noise in the subject infant based on cross-referencing signals from the plurality of wireless sound sensors. He infant gastrointestinal monitor also includes a controller, operatively coupled to the plurality of wireless sound sensors, for analyzing the location and one or more other parameters of the gastrointestinal noise to identify a probable cause of the noise and a recommended action for a caregiver to alleviate an underlying condition causing the noise.
    Type: Application
    Filed: December 4, 2017
    Publication date: June 6, 2019
    Inventors: Jean Wynne, Marc A. Bergendahl, Jonathan Fry, Christopher Waskiewicz, Christopher J. Penny, James J. Demarest
  • Publication number: 20190172924
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.
    Type: Application
    Filed: January 20, 2019
    Publication date: June 6, 2019
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20190172927
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.
    Type: Application
    Filed: December 4, 2017
    Publication date: June 6, 2019
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Patent number: 10229986
    Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: March 12, 2019
    Assignee: International Business Machines Corporation
    Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
  • Publication number: 20180122892
    Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.
    Type: Application
    Filed: December 28, 2017
    Publication date: May 3, 2018
    Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
  • Publication number: 20180061933
    Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.
    Type: Application
    Filed: September 1, 2016
    Publication date: March 1, 2018
    Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz