Patents by Inventor Christopher Waskiewicz
Christopher Waskiewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11113533Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.Type: GrantFiled: September 17, 2019Date of Patent: September 7, 2021Assignee: International Business Machines CorporationInventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
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Patent number: 10825916Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.Type: GrantFiled: January 19, 2020Date of Patent: November 3, 2020Assignee: International Business Machines CorporationInventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20200152766Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.Type: ApplicationFiled: January 19, 2020Publication date: May 14, 2020Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Patent number: 10566414Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.Type: GrantFiled: September 1, 2016Date of Patent: February 18, 2020Assignee: International Business Machines CorporationInventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
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Patent number: 10559672Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.Type: GrantFiled: January 20, 2019Date of Patent: February 11, 2020Assignee: International Business Machines CorporationInventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Patent number: 10559671Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.Type: GrantFiled: May 6, 2019Date of Patent: February 11, 2020Assignee: International Business Machines CorporationInventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20200026924Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.Type: ApplicationFiled: September 17, 2019Publication date: January 23, 2020Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
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Patent number: 10528817Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.Type: GrantFiled: December 12, 2017Date of Patent: January 7, 2020Assignee: International Business Machines CorporationInventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
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Patent number: 10475878Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.Type: GrantFiled: December 28, 2017Date of Patent: November 12, 2019Assignee: International Business Machines CorporationInventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
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Publication number: 20190259854Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.Type: ApplicationFiled: May 6, 2019Publication date: August 22, 2019Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20190180106Abstract: A computer-implemented method executed by a processor for reducing exposure of a plurality of objects to environmental conditions by employing a smart room tracking system is presented. The computer-implemented method includes counting a number of individuals within a space including the plurality of objects via one or more image capture devices and determining whether each individual makes direct eye contact with any of the plurality of objects by evaluating orientation, posture, and eye movement of each individual. The computer-implemented method further includes shielding, via an object viewing controller, an object of the plurality of objects from view when no direct eye contact is determined and making an object of the plurality of objects viewable, via the object viewing controller, when direct eye contact is determined.Type: ApplicationFiled: December 12, 2017Publication date: June 13, 2019Inventors: Marc A. Bergendahl, Christopher J. Penny, James J. Demarest, Christopher Waskiewicz, Jean Wynne, Jonathan Fry
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Patent number: 10319833Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.Type: GrantFiled: December 4, 2017Date of Patent: June 11, 2019Assignee: International Business Machines CorporationInventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20190167226Abstract: An infant gastrointestinal monitor and a method for infant gastrointestinal monitoring are provided. The infant gastrointestinal monitor includes a belly band for placing around at least a midsection area of a subject infant. The infant gastrointestinal monitor further includes a plurality of wireless sound sensors, integrated with the belly band in an array configuration, for identifying a location of a gastrointestinal noise in the subject infant based on cross-referencing signals from the plurality of wireless sound sensors. He infant gastrointestinal monitor also includes a controller, operatively coupled to the plurality of wireless sound sensors, for analyzing the location and one or more other parameters of the gastrointestinal noise to identify a probable cause of the noise and a recommended action for a caregiver to alleviate an underlying condition causing the noise.Type: ApplicationFiled: December 4, 2017Publication date: June 6, 2019Inventors: Jean Wynne, Marc A. Bergendahl, Jonathan Fry, Christopher Waskiewicz, Christopher J. Penny, James J. Demarest
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Publication number: 20190172924Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.Type: ApplicationFiled: January 20, 2019Publication date: June 6, 2019Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20190172927Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a top spacer including open gaps to reduce capacitance therebetween. Techniques for fabricating the transistor include using a sacrificial spacer that is selectively removed prior to growth of the top source/drain region. The top source/drain region may be confined by opposing dielectric layers.Type: ApplicationFiled: December 4, 2017Publication date: June 6, 2019Inventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Patent number: 10229986Abstract: A vertical transport field-effect transistor includes a top source/drain region separated from an underlying gate stack by a multi-layer top spacer that includes an oxygen barrier layer beneath a top dielectric layer. Techniques for fabricating the transistor include depositing the oxygen barrier layer over the gate stack prior to depositing the top dielectric layer. The oxygen barrier layer blocks oxygen diffusion during deposition of the top dielectric layer, thereby avoiding damage to underlying interfacial and gate dielectric layers.Type: GrantFiled: December 4, 2017Date of Patent: March 12, 2019Assignee: International Business Machines CorporationInventors: Hemanth Jagannathan, Choonghyun Lee, Alexander Reznicek, Christopher Waskiewicz
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Publication number: 20180122892Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.Type: ApplicationFiled: December 28, 2017Publication date: May 3, 2018Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz
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Publication number: 20180061933Abstract: A backend-of-the-line (BEOL) semiconductor capacitor made by method, apparatus, or computer program product, through an airgap metallization process, patterning a first electrode by removing a portion of inter-layer dielectric for a desired capacitor area, depositing a dielectric for a capacitor insulator, filling the desired capacitor area to form a second electrode, polishing and capping the second electrode, and interconnecting the first electrode and the second electrode.Type: ApplicationFiled: September 1, 2016Publication date: March 1, 2018Inventors: Marc A. Bergendahl, James J. Demarest, Christopher J. Penny, Christopher Waskiewicz