Abstract: A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.

Abstract: A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.

Abstract: A sensor assembly for accurately measuring the temperature of a process fluid flowing within process tubing is disclosed. A thermocouple sensor can be configured within a protective sheath with leads protruding from the sheath. A gland-like structure can be coupled to the sheath or machined integral to the sheath. The sensor assembly can be coupled to a closed loop. The sensor can be positioned within or in close proximity to the fluid flowing in the closed loop, and the sensor accurately measures the temperature of the process fluid flowing in the closed loop. The sensor assembly is easily assembled and/or disassembled allowing the sensor to be maintained.