Patents by Inventor Christos Dimitrakopoulos

Christos Dimitrakopoulos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240013921
    Abstract: An approach is provided to computationally identify biomarkers associated with diseases and medical conditions. The procedure first identifies biomarkers individually at the DNA, RNA and proteome levels. Then provides a methodology to integrate the single-source biomarkers and perform dimensionality reduction in order to detect the most informative subset of biomarkers that better distinguish samples between two biological conditions (disease vs normal samples). The dimensionality reduction step minimizing biases due to unnecessary or partially correlated biomarkers and significantly reduces the search space of possible biomarkers. An algorithm is also described for the automated optimization of the proposed DNA-seq and RNA-seq pipelines.
    Type: Application
    Filed: September 26, 2023
    Publication date: January 11, 2024
    Applicant: INSYBIO INC.
    Inventors: KONSTANTINOS THEOFILATOS, CHRISTOS ALEXAKOS, AIGLI KORFIATI, CHRISTOS DIMITRAKOPOULOS, SEFERINA MAVROUDI
  • Patent number: 10957816
    Abstract: An electronic device includes a spreading layer and a first contact layer formed over and contacting the spreading layer. The first contact layer is formed from a thermally conductive crystalline material having a thermal conductivity greater than or equal to that of an active layer material. An active layer includes one or more III-nitride layers. A second contact layer is formed over the active layer, wherein the active layer is disposed vertically between the first and second contact layers to form a vertical thin film stack.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: March 23, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Can Bayram, Jack O. Chu, Christos Dimitrakopoulos, Jeehwan Kim, Hongsik Park, Devendra K. Sadana
  • Patent number: 10821709
    Abstract: An article of manufacture includes a first graphene layer, a second graphene layer over the first graphene layer, the second graphene layer oriented at a first interlayer twist angle with respect to the first graphene layer and bonded by interlayer covalent bonds to the first graphene layer, and a third graphene layer over the second graphene layer, the third graphene layer oriented at a second interlayer twist angle with respect to the second graphene layer and bonded by interlayer covalent bonds to the second graphene layer. A multi-layer graphene article includes at least three graphene layers, each graphene layer being oriented at an interlayer twist angle with respect to an adjacent graphene layer and bonded by interlayer covalent bonds to the adjacent graphene layer.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: November 3, 2020
    Assignees: University of Massachusetts, Universidade Federal Do Rio Grande Do Sul-UFRGS, The Government of the United States of America, As Represented by the Secretary of the Navy
    Inventors: Christos Dimitrakopoulos, Dimitrios Maroudas, Andre R. Muniz, David Kurt Gaskill
  • Patent number: 10792657
    Abstract: This invention provides microfluidic devices with graphene films as architectural materials and methods of fabrication and use thereof in X-ray analysis.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: October 6, 2020
    Assignee: University of Massachusetts
    Inventors: Shuo Sui, Yuxi Wang, Christos Dimitrakopoulos, Sarah L. Perry
  • Publication number: 20200189240
    Abstract: An article of manufacture includes a first graphene layer, a second graphene layer over the first graphene layer, the second graphene layer oriented at a first interlayer twist angle with respect to the first graphene layer and bonded by interlayer covalent bonds to the first graphene layer, and a third graphene layer over the second graphene layer, the third graphene layer oriented at a second interlayer twist angle with respect to the second graphene layer and bonded by interlayer covalent bonds to the second graphene layer. A multi-layer graphene article includes at least three graphene layers, each graphene layer being oriented at an interlayer twist angle with respect to an adjacent graphene layer and bonded by interlayer covalent bonds to the adjacent graphene layer.
    Type: Application
    Filed: February 13, 2020
    Publication date: June 18, 2020
    Inventors: Christos Dimitrakopoulos, Dimitrios Maroudas, Andre R. Muniz, David Kurt Gaskill
  • Patent number: 10562278
    Abstract: An article of manufacture includes a first graphene layer, a second graphene layer over the first graphene layer, the second graphene layer oriented at a first interlayer twist angle with respect to the first graphene layer and bonded by interlayer covalent bonds to the first graphene layer, and a third graphene layer over the second graphene layer, the third graphene layer oriented at a second interlayer twist angle with respect to the second graphene layer and bonded by interlayer covalent bonds to the second graphene layer. A multi-layer graphene article includes at least three graphene layers, each graphene layer being oriented at an interlayer twist angle with respect to an adjacent graphene layer and bonded by interlayer covalent bonds to the adjacent graphene layer.
    Type: Grant
    Filed: May 18, 2015
    Date of Patent: February 18, 2020
    Assignees: University of Massachusetts, Universidade Federal do Rio Grande do SuI-UFRGS, The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Christos Dimitrakopoulos, Dimitrios Maroudas, Andre R. Muniz, D. Kurt Gaskill
  • Publication number: 20190055129
    Abstract: An embodiment according to the invention provides methods for making interlayer covalent bonds in bilayer, trilayer, and multilayer graphene. Raman spectroscopy is used to characterize the resulting material, and the Raman peak at approximately 1330 cm?1 coincides with the characteristic peak of diamond and polycrystalline nanodiamond peaks published in the art. This indicates that the process induces the formation of sp3 carbon-carbon (C—C) bonds (similar to the ones in diamond) between the graphene layers. The graphene bilayer or multilayer converts to sp3 bonded carbon only partially, as the Raman spectrum also indicates a strong component of graphene still remaining in the bilayer or multilayer.
    Type: Application
    Filed: July 20, 2018
    Publication date: February 21, 2019
    Inventors: Christos Dimitrakopoulos, Dimitrios Maroudas, Yuxi Wang
  • Publication number: 20180214863
    Abstract: This invention provides microfluidic devices with graphene films as architectural materials and methods of fabrication and use thereof in X-ray analysis.
    Type: Application
    Filed: December 4, 2017
    Publication date: August 2, 2018
    Inventors: Shuo Sui, Yuxi Wang, Christos Dimitrakopoulos, Sarah L. Perry
  • Publication number: 20180166170
    Abstract: An approach is provided to computationally identify biomarkers associated with diseases and medical conditions. The procedure first identifies biomarkers individually at the DNA, RNA and proteome levels. Then provides a methodology to integrate the single-source biomarkers and perform dimensionality reduction in order to detect the most informative subset of biomarkers that better distinguish samples between two biological conditions (disease vs normal samples). The dimensionality reduction step minimizing biases due to unnecessary or partially correlated biomarkers and significantly reduces the search space of possible biomarkers. An algorithm is also described for the automated optimization of the proposed DNA-seq and RNA-seq pipelines.
    Type: Application
    Filed: December 11, 2017
    Publication date: June 14, 2018
    Inventors: KONSTANTINOS THEOFILATOS, CHRISTOS ALEXAKOS, AIGLI KORFIATI, CHRISTOS DIMITRAKOPOULOS, SEFERINA MAVROUDI
  • Patent number: 9993749
    Abstract: A method of exfoliating graphite into graphene uses a sequence of flow and sonication on graphite suspensions. Graphite particles after intense mixing/grinding in a liquid are found to be altered, graphite having curled-up edges, which increases its sensitivity to ultrasound. Quadrupled graphene yield is achieved through introducing chaotic flow pretreatment.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: June 12, 2018
    Assignee: University of Massachusetts
    Inventors: Horst Henning Winter, Christos Dimitrakopoulos
  • Publication number: 20170144889
    Abstract: A method of exfoliating graphite into graphene uses a sequence of flow and sonication on graphite suspensions. Graphite particles after intense mixing/grinding in a liquid are found to be altered, graphite having curled-up edges, which increases its sensitivity to ultrasound. Quadrupled graphene yield is achieved through introducing chaotic flow pretreatment.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Inventors: Horst Henning Winter, Christos Dimitrakopoulos
  • Publication number: 20170076036
    Abstract: Techniques are disclosed for identifying the likely functionality and sub-cellular localization of individual proteins by first creating a protein-protein interaction network where protein pairs are created from data available from databases and experimental results, and by guessing potential interacting protein pairs where no data exists. Inside each protein pair, mutual likely functionality and localization annotations are made using the known functionalities and localization of the two proteins. The resulting annotated proteins are clustered according to similarity of their annotations and for each cluster iterative mutual annotations in each protein pair enrich the previous functional annotations until no more functionality annotations can be made and results in proteins with at least one assigned functionality and localization duet. Ranking of the resulting assignments is done using the specificity and confidence of the assignment.
    Type: Application
    Filed: November 27, 2016
    Publication date: March 16, 2017
    Applicant: InSyBio Ltd
    Inventors: Konstantinos Theofilatos, Christos Dimitrakopoulos, Seferina Mavroudi, Aigli Korfiati, Christos Alexakos
  • Patent number: 9459797
    Abstract: A method for fabricating a photovoltaic device includes applying a diblock copolymer layer on a substrate and removing a first polymer material from the diblock copolymer layer to form a plurality of distributed pores. A pattern forming layer is deposited on a remaining surface of the diblock copolymer layer and in the pores in contact with the substrate. The diblock copolymer layer is lifted off and portions of the pattern forming layer are left in contact with the substrate. The substrate is etched using the pattern forming layer to protect portions of the substrate to form pillars in the substrate such that the pillars provide a radiation absorbing structure in the photovoltaic device.
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: October 4, 2016
    Assignee: GLOBALFOUNDRIES, INC
    Inventors: Christos Dimitrakopoulos, Augustin J. Hong, Jeehwan Kim, Devendra K. Sadana, Kuen-Ting Shiu
  • Patent number: 9412815
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: August 9, 2016
    Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, KARLSRUHE INSTITUTE OF TECHNOLOGY, TAIWAN BLUESTONE TECHNOLOGY LTD.
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin
  • Publication number: 20160207291
    Abstract: An article of manufacture includes a first graphene layer, a second graphene layer over the first graphene layer, the second graphene layer oriented at a first interlayer twist angle with respect to the first graphene layer and bonded by interlayer covalent bonds to the first graphene layer, and a third graphene layer over the second graphene layer, the third graphene layer oriented at a second interlayer twist angle with respect to the second graphene layer and bonded by interlayer covalent bonds to the second graphene layer. A multi-layer graphene article includes at least three graphene layers, each graphene layer being oriented at an interlayer twist angle with respect to an adjacent graphene layer and bonded by interlayer covalent bonds to the adjacent graphene layer.
    Type: Application
    Filed: May 18, 2015
    Publication date: July 21, 2016
    Inventors: Christos Dimitrakopoulos, Dimitrios Maroudas, Andre R. Muniz, D. Kurt Gaskill
  • Patent number: 9236477
    Abstract: Silicon-carbon alloy structures can be formed as inverted U-shaped structures around semiconductor fins by a selective epitaxy process. A planarization dielectric layer is formed to fill gaps among the silicon-carbon alloy structures. After planarization, remaining vertical portions of the silicon-carbon alloy structures constitute silicon-carbon alloy fins, which can have sublithographic widths. The semiconductor fins may be replaced with replacement dielectric material fins. In one embodiment, employing a patterned mask layer, sidewalls of the silicon-carbon alloy fins can be removed around end portions of each silicon-carbon alloy fin. An anneal is performed to covert surface portions of the silicon-carbon alloy fins into graphene layers. In one embodiment, each graphene layer can include only a horizontal portion in a channel region, and include a horizontal portion and sidewall portions in source and drain regions.
    Type: Grant
    Filed: February 17, 2014
    Date of Patent: January 12, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Jack O. Chu, Christos Dimitrakopoulos, Eric C. Harley, Judson R. Holt, Timothy J. McArdle, Matthew W. Stoker
  • Publication number: 20150280023
    Abstract: A method for fabricating a photovoltaic device includes applying a diblock copolymer layer on a substrate and removing a first polymer material from the diblock copolymer layer to form a plurality of distributed pores. A pattern forming layer is deposited on a remaining surface of the diblock copolymer layer and in the pores in contact with the substrate. The diblock copolymer layer is lifted off and portions of the pattern forming layer are left in contact with the substrate. The substrate is etched using the pattern forming layer to protect portions of the substrate to form pillars in the substrate such that the pillars provide a radiation absorbing structure in the photovoltaic device.
    Type: Application
    Filed: May 27, 2015
    Publication date: October 1, 2015
    Inventors: CHRISTOS DIMITRAKOPOULOS, AUGUSTIN J. HONG, JEEHWAN KIM, DEVENDRA K. SADANA, KUEN-TING SHIU
  • Publication number: 20150236147
    Abstract: Silicon-carbon alloy structures can be formed as inverted U-shaped structures around semiconductor fins by a selective epitaxy process. A planarization dielectric layer is formed to fill gaps among the silicon-carbon alloy structures. After planarization, remaining vertical portions of the silicon-carbon alloy structures constitute silicon-carbon alloy fins, which can have sublithographic widths. The semiconductor fins may be replaced with replacement dielectric material fins. In one embodiment, employing a patterned mask layer, sidewalls of the silicon-carbon alloy fins can be removed around end portions of each silicon-carbon alloy fin. An anneal is performed to covert surface portions of the silicon-carbon alloy fins into graphene layers. In one embodiment, each graphene layer can include only a horizontal portion in a channel region, and include a horizontal portion and sidewall portions in source and drain regions.
    Type: Application
    Filed: February 17, 2014
    Publication date: August 20, 2015
    Applicant: International Business Machines Corporation
    Inventors: Jack O. Chu, Christos Dimitrakopoulos, Eric C. Harley, Judson R. Holt, Timothy J. McArdle, Matthew W. Stoker
  • Patent number: 9059188
    Abstract: According to an aspect of the present principles, there is provided a method and an authentication apparatus. The method includes arranging a plurality of graphene resistors in parallel or series. The method further includes forming a unique identification code based on respective temperatures emanating from or respective voltages output from the plurality of graphene resistors when the plurality of graphene resistors are in a powered state.
    Type: Grant
    Filed: May 1, 2014
    Date of Patent: June 16, 2015
    Assignee: International Business Machines Corporation
    Inventors: Christos Dimitrakopoulos, Dirk Pfeiffer, Jean-Olivier Plouchart, Joshua T. Smith
  • Publication number: 20150048312
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Application
    Filed: September 25, 2014
    Publication date: February 19, 2015
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin