Patents by Inventor Chu-Chieh Lin

Chu-Chieh Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanoscale helical microstructures and channels from chiral poly(L-lactide) block containing block copolymers
    Patent number: 7135523
    Abstract: A method for making a series of nanoscale microstructures, including helical microstructures and cylindrical microstrustures. This method includes the steps of: (1) forming a chiral block copolymer containing a plurality of chiral first polymer blocks and a second polymer blocks wherein the chiral first polymer blocks have a volume fraction ranging from 20 to 49%; (2) causing a phase separation in the chiral block copolymer. In a preferred embodiment, the chiral block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, and the copolymerization process is a living copolymerization process which includes the following steps: (a) mixing styrene with BPO and 4-OH-TEMPO to form 4-hydroxy-TEMPO-terminated polystyrene; and (2) mixing the 4-hydroxy-TEMPO-terminated polystyrene with [?3-EDBP)Li2]2[(?3-nBu)Li(0.5Et2O)]2 and L-lactide in an organic solvent preferably CH2Cl2 to form the poly(styrene)-poly(L-lactide) chiral block copolymer.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: November 14, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Yeo-Wan Chiang, Chu-Chieh Lin, Bao-Tsan Ko, Yi-Chun Chen, Tsai-Ming Chung, Hsi-Hsin Shih, Jassy S. J. Wang
  • NANOSCALE HELICAL MICROSTRUCTURES AND CHANNELS FROM CHIRAL POLY(L-LACTIDE) BLOCK CONTAINING BLOCK COPOLYMERS
    Publication number: 20060211816
    Abstract: A method for making a series of nanoscale microstructures, including helical microstructures and cylindrical microstructures. This method includes the steps of: (1) forming a chiral block copolymer containing a plurality of chiral first polymer blocks and a second polymer blocks wherein the chiral first polymer blocks have a volume fraction ranging from 20 to 49%; (2) causing a phase separation in the chiral block copolymer. In a preferred embodiment, the chiral block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, and the copolymerization process is a living copolymerization process which includes the following steps: (a) mixing styrene with BPO and 4-OH-TEMPO to form 4-hydroxy-TEMPO-terminated polystyrene; and (2) mixing the 4-hydroxy-TEMPO-terminated polystyrene with [(?3-EDBP)Li2]2[(?3-nBu)Li(0.5Et2O)]2 and L-lactide in an organic solvent preferably CH2Cl2 to form the poly(styrene)-poly(L-lactide) chiral block copolymer.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 21, 2006
    Inventors: Rong-Ming Ho, Yeo-Wan Chiang, Chu-Chieh Lin, Bao-Tsan Ko, Yi-Chun Chen, Tsai-Ming Chung, Hsi-Hsin Shih, Jassy Wang
  • Acrylonitrile block copolymer and method for producing the same
    Publication number: 20040127638
    Abstract: An acrylonitrile block copolymer and method for producing the same. A macroinitiator is produced by halogenating the terminal group of the polyester. The macroinitiator then contacts with acrylonitrile (AN) monomer or its derivative in the presence of the metal catalyst and solvent mixture to produce a block copolymer composed of a polyacrylonitrile, and a polyester.
    Type: Application
    Filed: June 23, 2003
    Publication date: July 1, 2004
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Lizamma Mathew, Kuo-Chen Shih, Hsi-Hsin Shih, Joung-Yei Chen, Rong-Ming Ho, Chu-Chieh Lin