Patents by Inventor Chu-Chien Lin

Chu-Chien Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanopatterned templates from oriented degradable diblock copolymer thin films
    Patent number: 7632544
    Abstract: A nanopatterned template for use in manufacturing nanoscale objects. The nanopatterned template contains a nanoporous thin film with a periodically ordered porous geomorphology which is made from a process comprising the steps of: (a) using a block copolymerization process to prepare a block copolymer comprising first and second polymer blocks, the first and second polymer blocks being incompatible with each other; (b) forming a thin film under conditions such that the first polymer blocks form into a periodically ordered topology; and (c) selectively degrading the first polymer blocks to cause the thin film to become a nanoporous material with a periodically ordered porous geomorphology. In a preferred embodiment, the block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, the first polymer is poly(L-lactide), and the second polymer is polystyrene.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: December 15, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Hui-Wen Fan, Wen-Hsien Tseng, Yeo-Wan Chiang, Chu-Chien Lin, Bao-Tsan Ko, Bor-Hunn Huang, Hsi-Hsin Shih, Joung-Yei Chen
  • Nanopatterned templates from oriented degradable diblock copolymer thin films
    Publication number: 20040265548
    Abstract: A nanopatterned template for use in manufacturing nanoscale objects. The nanopatterned template contains a nanoporous thin film with a periodically ordered porous geomorphology which is made from a process comprising the steps of: (a) using a block copolymerization process to prepare a block copolymer comprising first and second polymer blocks, the first and second polymer blocks being incompatible with each other; (b) forming a thin film under conditions such that the first polymer blocks form into a periodically ordered topology; and (c) selectively degrading the first polymer blocks to cause the thin film to become a nanoporous material with a periodically ordered porous geomorphology. In a preferred embodiment, the block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, the first polymer is poly(L-lactide), and the second polymer is polystyrene.
    Type: Application
    Filed: May 18, 2004
    Publication date: December 30, 2004
    Inventors: Rong-Ming Ho, Hui-Wen Fan, Wen-Hsien Tseng, Yeo-Wan Chiang, Chu-Chien Lin, Bao-Tsan Ko, Bor-Hunn Huang, Hsi-Hsin Shih, Chen Joung-Yei