Patents by Inventor Chu-Hung Wade Wei

Chu-Hung Wade Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-aqueous tungsten compatible metal nitride selective etchants and cleaners
    Patent number: 11319513
    Abstract: Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: May 3, 2022
    Assignee: AVANTOR PERFORMANCE MATERIALS, LLC
    Inventors: Chien-Pin Sherman Hsu, Chun-Yi Sam Chiu, Chu-Hung Wade Wei, Mi Yeon Oh
  • NON-AQUEOUS TUNGSTEN COMPATIBLE METAL NITRIDE SELECTIVE ETCHANTS AND CLEANERS
    Publication number: 20200399565
    Abstract: Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.
    Type: Application
    Filed: March 23, 2017
    Publication date: December 24, 2020
    Inventors: Chien-Pin Sherman Hsu, Sam Chun-Yi Chiu, Chu-Hung Wade Wei, Mi Yeon Oh