Patents by Inventor Chu-Liang Ho

Chu-Liang Ho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11969752
    Abstract: The present invention discloses an organic polymer film and a manufacturing method thereof. The organic polymer film is mainly manufactured by the following steps. Firstly, the step (A) provides a xylene precursor and a substrate, and the step (B) places the substrate inside of a plasma equipment. After that, the step (C) evacuates the plasma equipment while introducing a carrier gas which carries vapor of the xylene precursor, and the step (D) turns on a pulse power supply system of the plasma equipment, generating a short pulse for plasma ignition. Finally, the step (E) forms the organic polymer film on the substrate. In the aforementioned steps, the frequency of the short pulse plasma is between 1 Hz˜10,000 Hz, and the pulse period of the short pulse plasma is between 1 ?s˜60 ?s.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: April 30, 2024
    Assignee: FENG CHIA UNIVERSITY
    Inventors: Ping-Yen Hsieh, Xuan-Xuan Chang, Ying-Hung Chen, Chu-Liang Ho
  • Publication number: 20220193719
    Abstract: The present invention discloses an organic polymer film and a manufacturing method thereof. The organic polymer film is mainly manufactured by the following steps. Firstly, the step (A) provides a xylene precursor and a substrate, and the step (B) places the substrate inside of a plasma equipment. After that, the step (C) evacuates the plasma equipment while introducing a carrier gas which carries vapor of the xylene precursor, and the step (D) turns on a pulse power supply system of the plasma equipment, generating a short pulse for plasma ignition. Finally, the step (E) forms the organic polymer film on the substrate. In the aforementioned steps, the frequency of the short pulse plasma is between 1 Hz˜10,000 Hz, and the pulse period of the short pulse plasma is between 1 ?s˜60 ?s.
    Type: Application
    Filed: December 17, 2021
    Publication date: June 23, 2022
    Inventors: PING-YEN HSIEH, XUAN-XUAN CHANG, YING-HUNG CHEN, CHU-LIANG HO
  • Publication number: 20220199282
    Abstract: The invention discloses a flexible transparent conductive composite film and the manufacturing method thereof. The aforementioned flexible transparent conductive composite film is formed by depositing the first target material and the second target material in an alternating manner by HiPIMS. Therefore, the post-anneal step of the traditional method can be omitted, and the manufacturing efficiency of the flexible transparent conductive composite films is significantly improved.
    Type: Application
    Filed: December 14, 2021
    Publication date: June 23, 2022
    Inventors: JIA-LIN SYU, YING-HUNG CHEN, PING-YEN HSIEH, CHU-LIANG HO
  • Publication number: 20220095444
    Abstract: The present invention discloses a plasma aerosol device, comprising a gas tunnel, a dielectric barrier discharge module, and a liquid tunnel. The invention uses a mechanism similar to a dielectric barrier discharge (DBD) electrode system, thus to enable generating a plasma active water mist which riches in free radicals such as reactive nitrogen species (RNS) and reactive oxygen species (ROS). Therefore, this invention is able to be used in medical, sterilization, agriculture and preservation industries.
    Type: Application
    Filed: December 15, 2020
    Publication date: March 24, 2022
    Inventors: GUAN-HENG LYU, YING-HUNG CHEN, PING-YEN HSIEH, TSUNG-HAN CHEN, CHU-LIANG HO
  • Publication number: 20080081126
    Abstract: A method for forming a dielectric film on a substrate through reaction of a reactant mixture in a deposition chamber, the reactant mixture being dissociated and ionized by a plasma generated in the deposition chamber. In particular, the method includes applying a first working voltage of a first polarity to an electrode in the deposition chamber for enabling dissociation and ionization of the reactant mixture, and removing undesired electrical charge accumulated on the deposited dielectric film on the substrate by for example, applying a second working voltage of a second polarity to the electrode.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 3, 2008
    Inventors: Chu-Liang Ho, Wen-Li Lo