Patents by Inventor Chuan-Han Hsieh

Chuan-Han Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12202899
    Abstract: An anti-PD-L1 antibody, or an antigen-binding fragment thereof, comprising: a heavy chain variable region comprising the three CDRs with the sequences of SEQ ID NOs: 2-4, 6-8, 10-12, 14-16, or 18-20; and/or a light chain variable region comprising the three CDRs with the sequences of SEQ ID NOs: 22-24, 26-28, 30-32, 34-36, or 38-40, wherein the antibody is a chimeric, humanized, composite, or human antibody.
    Type: Grant
    Filed: July 14, 2019
    Date of Patent: January 21, 2025
    Assignee: Development Center for Biotechnology
    Inventors: Cheng-Chou Yu, Shih-Rang Yang, Tsung-Han Hsieh, Mei-Chi Chan, Shu-Ping Yeh, Chuan-Lung Hsu, Ling-Yueh Hu, Chih-Lun Hsiao
  • Publication number: 20070221618
    Abstract: An etching apparatus is described, including an etching chamber, a gas pipe, a gas distribution plate and a heater. The gas pipe is disposed above the etching chamber for delivering a gas to the exterior surface of the etching chamber. The gas distribution plate is disposed at the outlet of the gas pipe, including a plate body and an inner collar-shaped part thereon facing the outlet of the gas pipe. The inner collar-shaped part and the portion of the plate body around the inner collar-shaped part each has multiple through holes therein. The heater is disposed around the space between the gas pipe and the etching chamber for heating the gas flowing out of the gas distribution plate.
    Type: Application
    Filed: May 31, 2007
    Publication date: September 27, 2007
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chuan-Han Hsieh, Yu-Ming Liu, Chiu-Liang Li, Hui-Chin Hsu, Kuo-Chih Yeh, Hung-Te Cheng, Chien-En Hsu
  • Publication number: 20070138134
    Abstract: An etching apparatus is described, including an etching chamber, a gas pipe, a gas distribution plate and a heater. The gas pipe is disposed above the etching chamber for delivering a gas to the exterior surface of the etching chamber. The gas distribution plate is disposed at the outlet of the gas pipe, including a plate body and an inner collar-shaped part thereon facing the outlet of the gas pipe. The inner collar-shaped part and the portion of the plate body around the inner collar-shaped part each has multiple through holes therein. The heater is disposed around the space between the gas pipe and the etching chamber for heating the gas flowing out of the gas distribution plate.
    Type: Application
    Filed: December 19, 2005
    Publication date: June 21, 2007
    Inventors: Chuan-Han Hsieh, Yu-Ming Liu, Chiu-Liang Li, Hui-Chin Hsu, Kuo-Chih Yeh, Hung-Te Cheng, Chien-En Hsu