Patents by Inventor Chuan-Lun Hsu

Chuan-Lun Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF FORMING A LIGHT GUIDE PLATE INSERT MOLD
    Publication number: 20060073421
    Abstract: A substrate is provided, and a surface treating process is performed on the surface of the substrate. Then, a plurality of photo resist patterns are formed on the substrate, and a flow process is performed so that each photo resist pattern has a microlens surface. Finally, a metal layer is formed on the photo resist patterns so that the bottom surface of the metal layer has a plurality of patterns complementary to the photo resist patterns.
    Type: Application
    Filed: October 6, 2004
    Publication date: April 6, 2006
    Inventors: Irene Chen, Jyh-Huei Lay, Tien-Yu Chou, Yuan-Hung Wang, Chin-Chen Yang, Chuan-Lun Hsu
  • Method of fabricating a stamper by half-tone technology
    Patent number: 6994951
    Abstract: First, a substrate is provided, and a half-tone mask is employed to perform an exposing and developing process for forming a plurality of photoresist patterns having different thickness. Then, a flow process is performed to heat the photoresist patterns so that each photoresist pattern has a microlens surface. Following that, a metal plate is formed on the substrate for obtaining a plurality of patterns, which are opposite to the plurality of photoresist patterns, on the bottom surface. Finally, the metal plate is removed from the substrate, and combined with an insert mold.
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: February 7, 2006
    Assignee: U-Tech Media Corp.
    Inventors: Irene Chen, Tien-Yu Chou, Jyh-Huei Lay, Yuan-Hung Wang, Jo-Wen Wu, Chin-Chen Yang, Chuan-Lun Hsu
  • METHOD FOR FABRICATING METALLIC STRUCTURE
    Publication number: 20050208435
    Abstract: First, a substrate is provided and a photoresist layer is coated thereon. Then, a film having a pattern is used as a mask to perform an exposing and developing process for patterning the photoresist layer. Following that, LIGA technology is employed to form a thin film having a pattern corresponding to the pattern of the film.
    Type: Application
    Filed: March 19, 2004
    Publication date: September 22, 2005
    Inventors: Irene Chen, Jyh-Huei Lay, Tien-Yu Chou, Yih-Far Chen, Yuan-Hung Wang, Jo-Wen Wu, Kuo-Hsiung Yen, Chin-Chen Yang, Chuan-Lun Hsu, Wei-Chih Ma, Hung-Lung Chuang