Abstract: A flexible capacitive tactile sensor is provided. The flexible capacitive tactile sensor may include a first flexible electrode layer, a second flexible electrode layer, and an ion gel thin film dielectric layer disposed between the first flexible electrode layer and the second flexible electrode layer. A first electrode array is disposed on the first flexible electrode layer. The first electrode array may include m series-connected electrodes parallel to a second direction. A second electrode array is disposed on the second flexible electrode layer. The second electrode array may include n series-connected electrodes parallel to a first direction. The first electrode array and the second electrode array may be disposed opposite to each other, and the first direction may be different from the second direction. The first electrode array, the second electrode array, and the ion gel thin film dielectric layer may form m×n electric double layer capacitors.

Abstract: This disclosure provides a flexible capacitor array and a preparation method therefor, a capacitor array detection system, and a robot. The flexible capacitor array includes: a first flexible electrode layer including a first electrode array; a second flexible electrode layer including a second electrode array arranged opposite to the first electrode array; and a spacer layer and a dielectric layer, the spacer layer and the dielectric layer being arranged between each electrode pair arranged opposite in the first electrode array and the second electrode array. A unit capacitor in the flexible capacitor array includes the electrode pair, the spacer layer, and the dielectric layer.

Abstract: A flexible capacitive tactile sensor is provided. The flexible capacitive tactile sensor may include a first flexible electrode layer, a second flexible electrode layer, and an ion gel thin film dielectric layer disposed between the first flexible electrode layer and the second flexible electrode layer. A first electrode array is disposed on the first flexible electrode layer. The first electrode array may include m series-connected electrodes parallel to a second direction. A second electrode array is disposed on the second flexible electrode layer. The second electrode array may include n series-connected electrodes parallel to a first direction. The first electrode array and the second electrode array may be disposed opposite to each other, and the first direction may be different from the second direction. The first electrode array, the second electrode array, and the ion gel thin film dielectric layer may form m×n electric double layer capacitors.

Abstract: This application discloses a flexible sensing system and an associated proximity sensing method. The flexible sensing system includes: a first thin film encapsulation layer and a first electrode layer attached to the first thin film encapsulation layer; the first electrode layer includes a bipolar electrode configured for forming an arc-shaped electric field for determining whether a distance between a target object and the sensing system is within the first distance range; the first electrode layer further includes a unipolar electrode configured for forming a vertical electric field for determining whether a distance between the target object and the sensing system is within the second distance range; and the first distance range is less than the second distance range. By using different sensing solutions for the object at different distance positions, the sensing system avoids the issue that a single sensing solution has a relatively low sensing accuracy.

Abstract: This disclosure relates to a sensor, a sensing device, and a sensing method. The sensor may include an upper electrode layer, a dielectric layer, and a lower electrode layer. A first dielectric layer surface of the dielectric layer may be attached to a first upper electrode surface of the upper electrode layer. A second dielectric layer surface of the dielectric layer may be attached to a first lower electrode surface of the lower electrode layer. The second dielectric layer surface may be opposite to the first dielectric layer surface. The upper electrode layer may include at least two sub-upper electrodes arranged in an array. An electrode gap may exist between the at least two sub-upper electrodes.

Abstract: Systems and methods of fabricating electrodes, including thin metallic films, include depositing a first metallic layer on a substrate and passivating the deposited layer. The processes of deposition and passivation may be done sequentially. In some embodiments, a plurality of substrates may be coated with a metallic layer and further processed at a later time, including passivation and disposal of additional layers as discussed herein.

Abstract: Systems and methods disclosed herein are directed towards the fabrication of a nanomesh composite filter (NCF) that can be manufactured according to various embodiments, all of which are intended to be fabricated in order to control the transmission, reflection, and absorption of various wavelengths bands. In particular, the disclosed embodiments may be used for heat shielding applications where certain wavelength ranges may be desirable to transmit and others may be desirable to reflect.

Abstract: Systems and methods disclosed herein are directed towards the fabrication of a nanomesh composite filter (NCF) that can be manufactured according to various embodiments, all of which are intended to be fabricated in order to control the transmission, reflection, and absorption of various wavelengths bands. In particular, the disclosed embodiments may be used for heat shielding applications where certain wavelength ranges may be desirable to transmit and others may be desirable to reflect.

Abstract: A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 300?/? when stretched to a strain of 200% in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.

Abstract: Systems and methods of fabricating electrodes, including thin metallic films, include depositing a first metallic layer on a substrate and passivating the deposited layer. The processes of deposition and passivation may be done sequentially. In some embodiments, a plurality of substrates may be coated with a metallic layer and further processed at a later time, including passivation and disposal of additional layers as discussed herein.

Abstract: Systems and methods disclosed herein are directed towards the fabrication of a nanomesh composite filter (NCF) that can be manufactured according to various embodiments, all of which are intended to be fabricated in order to control the transmission, reflection, and absorption of various wavelengths bands. In particular, the disclosed embodiments may be used for heat shielding applications where certain wavelength ranges may be desirable to transmit and others may be desirable to reflect.

Abstract: A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 300?/? when stretched to a strain of 200% in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.

Abstract: A metal optical grayscale mask includes a layer of metal film which is deposited on transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0 OD-0.05 OD. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal optical grayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple.

Abstract: A metal optical grayscale mask includes a layer of metal film which is deposited on transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0 OD-0.05 OD. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal optical grayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple.