Abstract: A system including a field device, a power interface, a short-range wireless transceiver, and at least one processor. The field device is configured to obtain measurements of one or more process variables in an industrial process control and automation system. The power interface is configured to provide 4-20 ma current to the apparatus and the field device. The short-range wireless transceiver is configured to transmit and receive the measurements. The at least one processor is configured to receive, from one or more other devices, a request for access to the measurements and transmit, to the one or more other devices, the measurements.

Abstract: A method, system, and apparatus for measuring mass flow comprises two tubes for transporting a material; two exciters wherein one of the two exciters is fixedly attached on each of the two tubes configured to induce a vibration in the two tubes; at least two sensors on each of the tubes; a test media flowing through the tube, wherein a phase difference in the tubes is indicative of a mass flow of the test media; and a comparer module operably connected to the at least two sensors on each of the tubes for determining a phase difference of the vibrations in the tubes and determining a mass flow according to the phase difference.

Abstract: An exciter associated with a mass flow primary comprises a rigid plate comprising a base, two outer struts, and an inner strut; at least one electromagnet formed over the inner strut; a protection circuit associated with the electromagnet; and an exciter circuit configured to induce a current in said electromagnet in order to cause vibration of said exciter.

Abstract: A method, system, and apparatus for measuring mass flow comprises two tubes for transporting a material; two exciters wherein one of the two exciters is fixedly attached on each of the two tubes configured to induce a vibration in the two tubes; at least two sensors on each of the tubes; a test media flowing through the tube, wherein a phase difference in the tubes is indicative of a mass flow of the test media; and a comparer module operably connected to the at least two sensors on each of the tubes for determining a phase difference of the vibrations in the tubes and determining a mass flow according to the phase difference.

Abstract: An exciter associated with a mass flow primary comprises a rigid plate comprising a base, two outer struts, and an inner strut; at least one electromagnet formed over the inner strut; a protection circuit associated with the electromagnet; and an exciter circuit configured to induce a current in said electromagnet in order to cause vibration of said exciter.

Abstract: An optical imaging apparatus is provided. The optical imaging apparatus includes a micro reflective mirror assembly and at least one imaging source. The micro reflective mirror assembly is mainly comprised of multiple micro reflective mirrors, and each micro reflective mirror has a first focus. The first focus of each micro reflective mirror is different from the first focus of other micro reflective mirror, and all the first focuses constitute a first focus group. A plurality of light emitted from the imaging source is reflected by the micro reflective mirror assembly so as to form an image in a first region that the first focus group defines.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid state laser and locating edges of the substrate. The cutting is stopped based on the edge location, to prevent impacting background elements. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire.

Abstract: A semiconductor device includes an ESD protection device on a substrate, and a resistor having a gate structure overlying a resistor well separating a first doped region coupled to the ESD protection device and a second doped region coupled to a supply voltage for passing an ESD current from the second doped region to the first doped region to turn on the ESD protection device for dissipating the ESD current during an ESD event. The resistor well has an impurity density lower than that of the first and second doped regions for increasing resistance therebetween.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.

Abstract: A semiconductor device includes an ESD protection device on a substrate, and a resistor having a gate structure overlying a resistor well separating a first doped region coupled to the ESD protection device and a second doped region coupled to a supply voltage for passing an ESD current from the second doped region to the first doped region to turn on the ESD protection device for dissipating the ESD current during an ESD event. The resistor well has an impurity density lower than that of the first and second doped regions for increasing resistance therebetween.

Abstract: The present invention discloses a frequency signal enabling apparatus and the method thereof for filtering noises and glitch when entering an operating mode from a power-saving mode. When the pulse width of the input frequency signal is smaller than the threshold pulse width, it will be considered as a noise and be filtered out. When the high-level pulse width of the input frequency signal is greater than the threshold, a first short pulse will be generated. When the low-level pulse width of the input frequency signal is greater than the threshold, a second short pulse will be generated. The relative position of the first short pulse and the second short pulse will be used to reconstruct the frequency signal, and the reconstructed frequency signal may serve as the operating frequency of the microprocessor or other digital IC.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid state laser and locating edges of the substrate. The cutting is stopped based on the edge location, to prevent impacting background elements. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire.

Abstract: The present invention discloses a frequency signal enabling apparatus and the method thereof for filtering noises and glitch when entering an operating mode from a power-saving mode. When the pulse width of the input frequency signal is smaller than the threshold pulse width, it will be considered as a noise and be filtered out. When the high-level pulse width of the input frequency signal is greater than the threshold, a first short pulse will be generated. When the low-level pulse width of the input frequency signal is greater than the threshold, a second short pulse will be generated. The relative position of the first short pulse and the second short pulse will be used to reconstruct the frequency signal, and the reconstructed frequency signal may serve as the operating frequency of the microprocessor or other digital IC.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.

Abstract: The present invention discloses a frequency signal enabling apparatus and the method thereof for filtering noises and glitch when entering an operating mode from a power-saving mode. When the pulse width of the input frequency signal is smaller than the threshold pulse width, it will be considered as a noise and be filtered out. When the high-level pulse width of the input frequency signal is greater than the threshold, a first short pulse will be generated. When the low-level pulse width of the input frequency signal is greater than the threshold, a second short pulse will be generated. The relative position of the first short pulse and the second short pulse will be used to reconstruct the frequency signal, and the reconstructed frequency signal may serve as the operating frequency of the microprocessor or other digital IC.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.

Abstract: The present invention discloses a frequency signal enabling apparatus and the method thereof for filtering noises and glitch when entering an operating mode from a power-saving mode. When the pulse width of the input frequency signal is smaller than the threshold pulse width, it will be considered as a noise and be filtered out. When the high-level pulse width of the input frequency signal is greater than the threshold, a first short pulse will be generated. When the low-level pulse width of the input frequency signal is greater than the threshold, a second short pulse will be generated. The relative position of the first short pulse and the second short pulse will be used to reconstruct the frequency signal, and the reconstructed frequency signal may serve as the operating frequency of the microprocessor or other digital IC.

Abstract: A process and system scribe sapphire substrates, by performing the steps of mounting a sapphire substrate, carrying an array of integrated device die, on a stage such as a movable X-Y stage including a vacuum chuck; and directing UV pulses of laser energy directed at a surface of the sapphire substrate using a solid-state laser. The pulses of laser energy have a wavelength below about 560 nanometers, and preferably between about 150 in 560 nanometers. In addition, energy density, spot size, and pulse duration are established at levels sufficient to induce ablation of sapphire. Control of the system, such as by moving the stage with a stationary beam path for the pulses, causes the pulses to contact the sapphire substrate in a scribe pattern at a rate of motion causing overlap of successive pulses sufficient to cut scribe lines in the sapphire substrate.