Patents by Inventor Chuchu Huang

Chuchu Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10705023
    Abstract: A solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction and used for detecting a heavy metal element. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode and a solution cathode. The hollow metal anode is connected to a positive electrode of the high-voltage power source by means of the ballast resistor, and the solution cathode is connected to a negative electrode of the high-voltage power source by means of a graphite electrode. The plasma apparatus is further configured in such a manner that a discharge region is formed between the hollow metal anode (10) and the solution cathode, and the hollow metal anode further serves as a sample introduction pipeline, so that gas to be detected enters the discharge region and is excited.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: July 7, 2020
    Assignee: SHANGHAI INSTITUTE OF CERAMICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Zheng Wang, Chuchu Huang, Qing Li, Jiamei Mo
  • Publication number: 20180372646
    Abstract: A solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction and used for detecting a heavy metal element. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode and a solution cathode. The hollow metal anode is connected to a positive electrode of the high-voltage power source by means of the ballast resistor, and the solution cathode is connected to a negative electrode of the high-voltage power source by means of a graphite electrode. The plasma apparatus is further configured in such a manner that a discharge region is formed between the hollow metal anode (10) and the solution cathode, and the hollow metal anode further serves as a sample introduction pipeline, so that gas to be detected enters the discharge region and is excited.
    Type: Application
    Filed: December 30, 2016
    Publication date: December 27, 2018
    Inventors: Zheng Wang, Chuchu Huang, Qing Li, Jiamei Mo