Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Abstract: A method for installing networked attached storage. The networked attached storage is connected to a network with a plurality of storage. In the method, a first and a second storage carriers are connected to a first and second storage devices respectively, and a system medium built-in operating system is set in a remote server of the network. Afterward, the operating system is loaded to the first storage carrier, and then the operating system is mirrored to the second storage carrier. Finally, the operating system is mirrored to the third and forth storage devices for installing the operating system with the network on the hard disk-free networked attached storage (NAS).