Patents by Inventor Chul Hee Jang

Chul Hee Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for supporting substrate and plasma etching apparatus having the same
    Patent number: 8980049
    Abstract: Provided are a substrate supporting apparatus and a plasma etching apparatus having the same. There is provided a substrate supporting apparatus that can separately provide powers to a central region and an edge region by disposing an electrode supporting a substrate at the central region of the substrate supporting apparatus, and disposing an electrode receiving radio frequency (RF) power at the edge region of the substrate supporting apparatus. There is provided a substrate edge etching apparatus having the substrate supporting apparatus for removing layers or particles deposited in an edge region of a semiconductor substrate and preventing damage of a center region of the semiconductor substrate during an etching process of the substrate edge.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: March 17, 2015
    Assignee: Charm Engineering Co., Ltd.
    Inventors: Won Haeng Lee, Kwan Goo Rha, Jung Hee Lee, Chul Hee Jang, Hyang Joo Lee, Dong Wan Kim
  • APPARATUS FOR SUPPORTING SUBSTRATE AND PLASMA ETCHING APPARATUS HAVING THE SAME
    Publication number: 20100096084
    Abstract: Provided are a substrate supporting apparatus and a plasma etching apparatus having the same. There is provided a substrate supporting apparatus that can separately provide powers to a central region and an edge region by disposing an electrode supporting a substrate at the central region of the substrate supporting apparatus, and disposing an electrode receiving radio frequency (RF) power at the edge region of the substrate supporting apparatus. There is provided a substrate edge etching apparatus having the substrate supporting apparatus for removing layers or particles deposited in an edge region of a semiconductor substrate and preventing damage of a center region of the semiconductor substrate during an etching process of the substrate edge.
    Type: Application
    Filed: April 1, 2008
    Publication date: April 22, 2010
    Applicant: SOSUL CO LTD.
    Inventors: Won Haeng Lee, Kwan Goo Rha, Jung Hee Lee, Chul Hee Jang, Hyang Joo Lee, Dong Wan Kim