Abstract: A display device includes a substrate, a display area disposed on the substrate and including a plurality of pixels and data lines, a peripheral area disposed outside the display area of the substrate, a pad portion disposed in the peripheral area, an encapsulation layer disposed in the peripheral area and the display area, and disposed on the plurality of pixels of the display area, a crack detection circuit disposed in the peripheral area, and a first crack detection line connected with the pad portion and the crack detection circuit. The first crack detection line is disposed on the encapsulation layer.

Abstract: A heat insulation material for an aerosol generating device includes a plurality of hollow beads, and a binder configured to bind the plurality of hollow beads together.

Abstract: A vaporizer and an aerosol-generating device including the vaporizer are provided. The vaporizer includes a liquid storage tank configured to store a liquid aerosol-generating material, and a wick-heater assembly including a porous wick that absorbs the stored aerosol-generating material through a porous body and a heater assembly that generates an aerosol by heating the absorbed aerosol-generating material.

Abstract: The present invention relates to a wick-heater assembly comprising a porous wick for absorbing a liquid aerosol-generating substrate, wherein the porous wick comprises a plurality of porous beads; and a heater for heating the absorbed liquid aerosol-generating substrate to generate an aerosol, wherein the heater is located embedded in one side of the porous wick or in the porous wick, and comprises a flat heating pattern in which a horizontal pattern and a vertical pattern are alternately repeated and connected, and wherein the spacing (A) between the vertical patterns in the heating pattern is greater than the diameter (B) of the porous bead; and an aerosol-generating device comprising the same.

Abstract: As an embodiment of the present disclosure, there is disclosed an aerosol generating device including: a heater configured to generate an aerosol by heating an aerosol generating substrate; a storage unit configured to store information regarding a first time period and a second time period for controlling a temperature of the heater; and a controller configured to control power supplied to the heater, wherein the controller, when the first time period time elapses after the temperature of the heater reaches the first target temperature, changes the temperature of the heater to a second target temperature for the second time period, and the sum of the first time period and the second time period is a time period in a preset change.

Abstract: The present invention relates to an electrostatic chuck heater and a manufacturing method therefor and, more particularly, to an electrostatic chuck heater comprising: a ground electrode; and an electrostatic chuck electrode spaced a predetermined distance apart from the outside of the ground electrode, wherein the heater can reduce the phenomenon of rising of a wafer edge and thus can significantly reduce the temperature deviation according to positions on a heating surface of an object, such as a wafer, so as to increase the temperature uniformity of the heating surface.

Abstract: An electrostatic chuck of the present invention includes a top block and a bottom block bonded by a bonding layer. The top block has a first plate on which a chucking electrode and a heater are installed, and the bottom block is provided with a cooling member. A second plate made of a material having lower heat transfer rate than the first plate is disposed between the first plate and the bottom block. Accordingly, when the heater is heated at a high temperature, it is possible to prevent the bonding layer from being damaged by thermal impact.

Abstract: Proposed is a substrate support unit, a method of manufacturing the same, and a substrate processing apparatus including the same. The substrate support unit includes a base component, a chucking component mounted on the base component, and an intermediate layer interposed between the base component and the chucking component, wherein the intermediate layer includes a joining part formed in a partial region to couple the base component and the chucking component.

Abstract: Disclosed is a ceramic heater and a ceramic plate for a ceramic heater, wherein, in order to prevent crack development at a ceramic surface around an electrode part and thereby improve durability, the end of a support part for an electrode rod is spaced apart from the ceramic surface opposite thereto, and a space for placing a filler mass is provided around the end of the support part for the electrode rod, whereby force or stress applied to the ceramic surface due to the expansion of the support part or by the filler mass is removed.

Abstract: The present invention relates to a ceramic heater for independently controlling a middle region, and more specifically, to a ceramic heater comprising: a center-edge heating element provided at a position corresponding to a center region and an edge region of a heating surface of the ceramic heater; and a middle heating element provided at a position corresponding to a middle region which is surrounded by the center region and the edge region of the heating surface of the ceramic heater, and thus the present invention has an effect whereby the respective temperatures of three divided regions may be

Abstract: The present invention relates to a substrate heating apparatus. More specifically, the present invention relates to a substrate heating apparatus including a first heating element located in an inner region of the substrate heating apparatus, a second heating element located in an outer region, and a third heating element supplying current to the second heating element passing through the inner region, wherein the diameter of a wire constituting the third heating element is thicker than the diameter of a wire constituting the second heating element, thereby inhibiting the generation of an overheating region by the heating of the third heating element.

Abstract: The present invention relates to an electrostatic chuck heater and a manufacturing method therefor and, more particularly, to an electrostatic chuck heater comprising: a ground electrode; and an electrostatic chuck electrode spaced a predetermined distance apart from the outside of the ground electrode, wherein the heater can reduce the phenomenon of rising of a wafer edge and thus can significantly reduce the temperature deviation according to positions on a heating surface of an object, such as a wafer, so as to increase the temperature uniformity of the heating surface.

Abstract: The present invention relates to a method for preparing a TNFR-Fc fusion protein mixture comprising a target content of hydrophobic chromatogram peak 3, and to a method for adjusting a content of hydrophobic chromatogram peak 3. Specifically, the present invention relates to (a) a method for preparing a TNFR-Fc fusion protein mixture using a hydrophobic interaction chromatograph medium containing an aromatic functional group, which is pre-equilibrated with an equilibration buffer comprising sodium chloride or ammonium sulfate, and a sample comprising a TNFR-Fc fusion protein mixture liquid produced from mammalian cells, and to a method for adjusting the content of hydrophobic chromatogram peak 3 by hydrophobic chromatography using an equilibration buffer containing a predetermined concentration of sodium chloride or ammonium sulfate.

Abstract: Disclosed is a ceramic heater and a ceramic plate for a ceramic heater, wherein, in order to prevent crack development at a ceramic surface around an electrode part and thereby improve durability, the end of a support part for an electrode rod is spaced apart from the ceramic surface opposite thereto, and a space for placing a filler mass is provided around the end of the support part for the electrode rod, whereby force or stress applied to the ceramic surface due to the expansion of the support part or by the filler mass is removed.

Abstract: A film for a backlight unit including a semiconductor nanocrystal-polymer composite film including a semiconductor nanocrystal and a matrix polymer in which the semiconductor nanocrystal is dispersed, wherein the matrix polymer is a polymer produced by a polymerization of a multifunctional photo-curable oligomer, a mono-functional photo-curable monomer, and a multifunctional photo-curable cross-linking agent, the multifunctional photo-curable oligomer has an acid value of less than or equal to about 0.1 mg of KOH/g, and a content (A1) of a first structural unit derived from the multifunctional photo-curable oligomer, a content (A2) of a second structural unit derived from the mono-functional photo-curable monomer, and a content (A3) of a third structural unit derived from the multifunctional photo-curable cross-linking agent satisfy Equation 1: A1<(A2+A3).

Abstract: A ceramic heater includes a ceramic body having a plurality of pin holes for a vertical movement of lift pins, a heating member disposed inside the ceramic body to heat a wafer which is placed on the ceramic body, and heat transfer members disposed on an upper surface of the ceramic body to surround upper portions of the pin holes, respectively. The pin holes are configured to pass through the ceramic body and the heat transfer members are used to transfer heat generated from the heating member to the wafer so as to uniformly heat the wafer.

Abstract: The present invention relates to a substrate heating apparatus. More specifically, the present invention relates to a substrate heating apparatus including a first heating element located in an inner region of the substrate heating apparatus, a second heating element located in an outer region, and a third heating element supplying current to the second heating element passing through the inner region, wherein the diameter of a wire constituting the third heating element is thicker than the diameter of a wire constituting the second heating element, thereby inhibiting the generation of an overheating region by the heating of the third heating element.

Abstract: The present invention relates to a method for preparing a TNFR-Fc fusion protein mixture comprising a target content of hydrophobic chromatogram peak 3, and to a method for adjusting a content of hydrophobic chromatogram peak 3. Specifically, the present invention relates to (a) a method for preparing a TNFR-Fc fusion protein mixture using a hydrophobic interaction chromatograph medium containing an aromatic functional group, which is pre-equilibrated with an equilibration buffer comprising sodium chloride or ammonium sulfate, and a sample comprising a TNFR-Fc fusion protein mixture liquid produced from mammalian cells, and to a method for adjusting the content of hydrophobic chromatogram peak 3 by hydrophobic chromatography using an equilibration buffer containing a predetermined concentration of sodium chloride or ammonium sulfate.

Abstract: A film for a backlight unit including a semiconductor nanocrystal-polymer composite film including a semiconductor nanocrystal and a matrix polymer in which the semiconductor nanocrystal is dispersed, wherein the matrix polymer is a polymer produced by a polymerization of a multifunctional photo-curable oligomer, a mono-functional photo-curable monomer, and a multifunctional photo-curable cross-linking agent, the multifunctional photo-curable oligomer has an acid value of less than or equal to about 0.1 mg of KOH/g, and a content (A1) of a first structural unit derived from the multifunctional photo-curable oligomer, a content (A2) of a second structural unit derived from the mono-functional photo-curable monomer, and a content (A3) of a third structural unit derived from the multifunctional photo-curable cross-linking agent satisfy Equation 1: A1<(A2+A3).

Abstract: A film for a backlight unit including a semiconductor nanocrystal-polymer composite film including a semiconductor nanocrystal and a matrix polymer in which the semiconductor nanocrystal is dispersed, wherein the matrix polymer is a polymer produced by a polymerization of a multifunctional photo-curable oligomer, a mono-functional photo-curable monomer, and a multifunctional photo-curable cross-linking agent, the multifunctional photo-curable oligomer has an acid value of less than or equal to about 0.1 mg of KOH/g, and a content (A1) of a first structural unit derived from the multifunctional photo-curable oligomer, a content (A2) of a second structural unit derived from the mono-functional photo-curable monomer, and a content (A3) of a third structural unit derived from the multifunctional photo-curable cross-linking agent satisfy Equation 1: A1<(A2+A3).