Patents by Inventor Chumeng Zheng

Chumeng Zheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Baseline overlay control with residual noise reduction
    Patent number: 10642161
    Abstract: Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: May 5, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng
  • BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION
    Publication number: 20200117100
    Abstract: Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.
    Type: Application
    Filed: October 10, 2018
    Publication date: April 16, 2020
    Inventors: Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng