Abstract: This disclosure is directed to a carbon capture system having an adsorption module, a fan module, a desorption chamber and a desorption line. The adsorption module has a plurality of adsorption units arranged in a coplanar array. Each of the adsorption units has a frame and a plurality of adsorption structures. The frame has an inlet end and an exhaust end. The adsorption structures are arranged in the frame, and the adsorption module is defined with a flow direction from the inlet ends toward the exhaust ends. The fan module is defined with an air outlet direction, and the air outlet direction is arranged along the flow direction. The desorption chamber is used for accommodating the adsorption module. One end of the desorption pipeline is connected to the desorption chamber, and the desorption pipeline is connected with a gas storage tank and a negative pressure pump arranged in series.

Abstract: This disclosure is directed to an adsorption unit, having a frame, multiple spacer pieces and multiple adsorption structures. The frame has an inlet side and an exhaust side. The spacer pieces are arranged in the frame. The adsorbed structures are arranged in the frame, and are restricted by the spacers and fixed in the frame so as to locate between the inlet side and the exhaust side. Air enters the adsorption unit from the environment through the inlet side, passes through the adsorption unit, and leaves the adsorption unit through the exhaust side. The air passes through the adsorption unit and returns to the environment so as to contact the adsorption structures to remove carbon dioxide and water.

Abstract: This disclosure is directed to an adsorption unit having spring structure, which has a frame, multiple limiting springs and multiple adsorption granules. The frame has an inlet side and an exhaust side. The limiting springs are arranged in the frame, and a slot is provided on each limiting spring. The adsorbed granules are arranged in the frame and restricted by the spacers and fixed in the frame so as to locate between the inlet side and the exhaust side. Air enters the adsorption unit from the environment through the inlet side, passes through the adsorption unit, and leaves the adsorption unit through the exhaust side. The air passes through the adsorption unit and returns to the environment so as to contact the adsorption granules to remove carbon dioxide and water.

Abstract: This disclosure is directed to an adsorption unit, having a frame, multiple spacer tubes and multiple adsorption granules. The frame has an inlet side and an exhaust side. The spacer tubes are arranged in the frame, and a plurality of through holes are provided on each of the spacer tubes. The adsorbed granules are arranged in the frame, and the adsorbed granules are restricted by the spacers and fixed in the frame so as to locate between the inlet side and the exhaust side. Air enters the adsorption unit from the environment through the inlet side, passes through the adsorption unit, and leaves the adsorption unit through the exhaust side. The air passes through the adsorption unit and returns to the environment so as to contact the adsorption granules to remove carbon dioxide and water.

Abstract: A plurality of holes in a top surface of a silicon medium form a plurality of sub-meta lenses to result in multiple focal points rather than a single point (resulting from using a single meta lens). As a result, optical paths for incoming light are reduced as compared with a single optical path associated with a single meta lens, which in turn reduces angular response of incident photons. Thus, a pixel sensor including the plurality of sub-meta lenses experiences improved light focus and greater signal-to-noise ratio. Additionally, dimensions of the pixel sensor are reduced (particularly a height of the pixel sensor), which allows for greater miniaturization of an image sensor that includes the pixel sensor.

Abstract: Various embodiments of the present application are directed towards an image sensor including a wavelength tunable narrow band filter, as well as methods for forming the image sensor. In some embodiments, the image sensor includes a substrate, a first photodetector, a second photodetector, and a filter. The first and second photodetectors neighbor in the substrate. The filter overlies the first and second photodetectors and includes a first distributed Bragg reflector (DBR), a second DBR, and a first interlayer between the first and second DBRs. A thickness of the first interlayer has a first thickness value overlying the first photodetector and a second thickness value overlying the second photodetector. In some embodiments, the filter is limited to a single interlayer. In other embodiments the filter further includes a second interlayer defining columnar structures embedded in the first interlayer and having a different refractive index than the first interlayer.

Abstract: Behavior report generation monitors the behavior of unknown sample files executing in a sandbox. Behaviors are encoded and feature vectors created based upon a q-gram for each sample. Prototypes extraction includes extracting prototypes from the training set of feature vectors using a clustering algorithm. Once prototypes are identified in this training process, the prototypes with unknown labels are reviewed by domain experts who add a label to each prototype. A K-Nearest Neighbor Graph is used to merge prototypes into fewer prototypes without using a fixed distance threshold and then assigning a malware family name to each remaining prototype. An input unknown sample can be classified using the remaining prototypes and using a fixed distance. For the case that no such prototype is close enough, the behavior report of a sample is rejected and tagged as an unknown sample or that of an emerging malware family.

Abstract: A computer includes a processor and a memory, and the memory stores instructions executable by the processor to generate a set of points from a measurement scan obtained by a lidar sensor and to generate an expected termination distance of the set of points based on a neural implicit representation of the set of points. The instructions may additionally be to compute a loss function that includes a relatively low margin correlated with the variance or standard deviation of a training distribution centered at a learned point of the set of points based on the expected termination distance of the learned point, the learned point being learned by the neural implicit representation. The instructions may additionally be to generate a keyframe from the set of points and to generate a pose of the lidar sensor based on the keyframe.

Abstract: A plating apparatus for electroplating a wafer includes a housing defining a plating chamber for housing a plating solution. A voltage source of the apparatus has a first terminal having a first polarity and a second terminal having a second polarity different than the first polarity. The first terminal is electrically coupled to the wafer. An anode is within the plating chamber, and the second terminal is electrically coupled to the anode. A membrane support is within the plating chamber and over the anode. The membrane support defines apertures, wherein in a first zone of the membrane support a first aperture-area to surface-area ratio is a first ratio, and in a second zone of the membrane support a second aperture-area to surface-area ratio is a second ratio, different than the first ratio.

Abstract: The present disclosure relates to an integrated chip including a substrate and a pixel. The pixel includes a photodetector. The photodetector is in the substrate. The integrated chip further includes a first inner trench isolation structure and an outer trench isolation structure that extend into the substrate. The first inner trench isolation structure laterally surrounds the photodetector in a first closed loop. The outer trench isolation structure laterally surrounds the first inner trench isolation structure along a boundary of the pixel in a second closed loop and is laterally separated from the first inner trench isolation structure. Further, the integrated chip includes a scattering structure that is defined, at least in part, by the first inner trench isolation structure and that is configured to increase an angle at which radiation impinges on the outer trench isolation structure.

Abstract: An example composition that is liquid includes thrombin and a constituent that includes one or more of guanidine derivatives or one or more anticoagulants. The one or more guanidine derivative may include 1-methylguanidine, 1,1-dimethylguanidine, 1,1-diethylguanidine, or N-benzyl-N-methylguanidine. The one or more anticoagulants may include rivaroxaban, apixaban, edoxaban, betrixaban, or a factor Xa anticoagulant.

Abstract: In certain embodiments a device is provided for electrorotation flow. In certain embodiments the device comprises a microfluidic channel comprising a plurality of electrodes disposed to provide dielectrophoretic (DEP) forces that are perpendicular to hydrodynamic flows along the channel; and a fluid within the channel providing the hydrodynamic flow along the channel; wherein the device is configured to apply focusing voltages to the electrodes that provide an electric field minimum in the channel and that focus cells, particles, and/or molecules or molecular complexes within the channel; and where the device is configured to apply rotation-inducing voltages to the electrodes that induce rotation of the cells, particles, molecules and/or molecular complexes as they flow through the channel.

Abstract: Systems and methods for using microfluidic devices to concentrate cells, to perform buffer changes, to sort cells based on size, and/or to isolate particular types of cells in a rapid manner, are presented. Cells flow into a matrix of posts, wherein the posts are distributed along diagonal lines in the chamber. The cells are deflected in a lateral manner, towards a side of a chamber and are collected upon exiting the chamber.

Abstract: A plating apparatus for electroplating a wafer includes a housing defining a plating chamber for housing a plating solution. A voltage source of the apparatus has a first terminal having a first polarity and a second terminal having a second polarity different than the first polarity. The first terminal is electrically coupled to the wafer. An anode is within the plating chamber, and the second terminal is electrically coupled to the anode. A membrane support is within the plating chamber and over the anode. The membrane support defines apertures, wherein in a first zone of the membrane support a first aperture-area to surface-area ratio is a first ratio, and in a second zone of the membrane support a second aperture-area to surface-area ratio is a second ratio, different than the first ratio.

Abstract: What is described is a kit for preparing a liquid thromboplastin reagent for a prothrombin time assay. The kit simplifies and minimizes reagent preparation time and is stable for 2-5 years.

Abstract: Systems and methods for using microfluidic devices to concentrate cells, to perform buffer changes, to sort cells based on size, and/or to isolate particular types of cells in a rapid manner, are presented. Cells flow into a matrix of posts, wherein the posts are distributed along diagonal lines in the chamber. The cells are deflected in a lateral manner, towards a side of a chamber and are collected upon exiting the chamber.

Abstract: A plating apparatus for electroplating a wafer includes a housing defining a plating chamber for housing a plating solution. A voltage source of the apparatus has a first terminal having a first polarity and a second terminal having a second polarity different than the first polarity. The first terminal is electrically coupled to the wafer. An anode is within the plating chamber, and the second terminal is electrically coupled to the anode. A membrane support is within the plating chamber and over the anode. The membrane support defines apertures, wherein in a first zone of the membrane support a first aperture-area to surface-area ratio is a first ratio, and in a second zone of the membrane support a second aperture-area to surface-area ratio is a second ratio, different than the first ratio.

Abstract: A plating apparatus for electroplating a wafer includes a housing defining a plating chamber for housing a plating solution. A voltage source of the apparatus has a first terminal having a first polarity and a second terminal having a second polarity different than the first polarity. The first terminal is electrically coupled to the wafer. An anode is within the plating chamber, and the second terminal is electrically coupled to the anode. A membrane support is within the plating chamber and over the anode. The membrane support defines apertures, wherein in a first zone of the membrane support a first aperture-area to surface-area ratio is a first ratio, and in a second zone of the membrane support a second aperture-area to surface-area ratio is a second ratio, different than the first ratio.

Abstract: A 3-dimensional PDMS cell sorter having multiple passages in a PDMS layer that follow the same path in a DEP separation region and that are in fluid communication with each other within that region. The passages may differ in width transverse to the flow direction within the passages. Flat plates may sandwich the PDMS layer; each plate may have a planar electrode used to generate a DEP field within a sample fluid flowed within the passages. The DEP field may concentrate target cells or particulates within one of the passages within the DEP separation region. The passages may diverge after the DEP-separation region, leaving one passage with a high concentration of target cells or particulates. Techniques for manufacturing such structures, as well as other micro-fluidic structures, are also provided.

Abstract: What is described is a kit for preparing a liquid thromboplastin reagent for a prothrombin time assay. The kit simplifies and minimizes reagent preparation time and is stable for 2-5 years.