Abstract: A semiconductor pattern is provided in the present invention, including a first line extending to one end in a first direction and a second line extending in a second direction perpendicular to the first direction and adjacent to the end of the first line in the first direction, wherein the end of the first line is provided with a rounding feature, the first line has a width in the second direction, and the width is gradually increased to a maximum width toward the end and gradually converged to form the rounding feature.

Abstract: An early warning system includes functional equipment, a first monitor unit, a second monitor unit, a calculation unit and a warning unit. The functional equipment is used to perform a functional operation. The first monitor unit is used to monitor the functional equipment so as to obtain a set of first data during a first period. The second monitor unit is used to monitor the functional equipment to obtain a set of second data during the first period. The calculation unit is used to receive the set of first data and the set of second data, obtain a correlation coefficient according to the set of first data and the set of second data, and compare the correlation coefficient with a threshold value. The warning unit is linked to the calculation unit and used to send a warning signal when at least the correlation coefficient reaches the threshold value.

Abstract: An early warning system includes functional equipment, a first monitor unit, a second monitor unit, a calculation unit and a warning unit. The functional equipment is used to perform a functional operation. The first monitor unit is used to monitor the functional equipment so as to obtain a set of first data during a first period. The second monitor unit is used to monitor the functional equipment to obtain a set of second data during the first period. The calculation unit is used to receive the set of first data and the set of second data, obtain a correlation coefficient according to the set of first data and the set of second data, and compare the correlation coefficient with a threshold value. The warning unit is linked to the calculation unit and used to send a warning signal when at least the correlation coefficient reaches the threshold value.

Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.

Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.