Abstract: In some implementations, one or more semiconductor processing tools may form a triple-stacked polysilicon structure on a substrate of a semiconductor device. The one or more semiconductor processing tools may form one or more polysilicon-based devices on the substrate of the semiconductor device, wherein the triple-stacked polysilicon structure has a first height that is greater than one or more second heights of the one or more polysilicon-based devices. The one or more semiconductor processing tools may perform a chemical-mechanical polishing (CMP) operation on the semiconductor device, wherein performing the CMP operation comprises using the triple-stacked polysilicon structure as a stop layer for the CMP operation.

Abstract: A thermoplastic polyurethane precursor that can be used to prepare a polyurethane having a low initial yellowness index, high yellowing resistance, high thermal oxidative aging resistance, high hydrolysis resistance, and low fisheye.

Abstract: A device includes: a substrate having a semiconductor fin; a stack of semiconductor channels on the substrate and positioned over the fin; a gate structure wrapping around the semiconductor channels; a source/drain abutting the semiconductor channels; an inner spacer positioned between the stack of semiconductor channels and the fin; an undoped semiconductor layer vertically adjacent the source/drain and laterally adjacent the fin; and an isolation structure that laterally surrounds the undoped semiconductor layer, the isolation structure being between the source/drain and the inner spacer.

Abstract: A slide rail assembly includes a first rail, a second rail, an aid-sliding device, a compensating device and a third rail. The aid-sliding device is movably mounted between the first rail and the second rail. The compensating device is movably mounted on the second rail. The second rail is configured to be movably mounted on the third rail. The compensating device is configured to compensating an error of a relative position of the first rail and the second rail.

Abstract: A slide rail assembly is provided and includes a first rail, a second rail, a blocking feature, an engaging member and an operating member. The second rail is displaceable relative to the first rail along a longitudinal direction. The blocking feature is arranged on the first rail. When the second rail is located at a predetermined position relative to the first rail, the blocking feature blocks the engaging member for preventing a displacement of the second rail from the predetermined position along a first direction. The operating member is configured to drive the engaging member, such that the engaging member is not blocked by the blocking feature for allowing the displacement of the second rail from the predetermined position along the first direction.

Abstract: A semiconductor includes a substrate. A gate structure is disposed on the substrate. A liner oxide contacts a side of the gate structure. A silicon oxide spacer contacts the liner oxide. An end of the silicon oxide spacer forms a kink profile. A silicon nitride spacer contacts the silicon oxide spacer and a tail of the silicon nitride spacer covers part of the kink profile. A stressor covers the silicon nitride spacer and the substrate.

Abstract: A driving mechanism is provided and includes a first casing, a second casing and an operating member. The second casing is arranged on the first casing. The operating member is movably mounted on one of the first casing and the second casing. When the operating member is moved from a first state to a second state, the operating member drives another one of the first casing and the second casing to move from a first predetermined position to a second predetermined position along a first vertical direction. When the operating member is moved from the second state to the first state, the another one of the first casing and the second casing moves from the second predetermined position to the first predetermined position along a second vertical direction opposite to the first vertical direction.

Abstract: A method (of generating a layout diagram, the layout diagram being stored on a non-transitory computer-readable medium) includes: selecting first and second standard cells from a standard-cell-library; the first and second standard cells having corresponding first and second heights that are different from each other; stacking the first standard cell on the second standard cell to form a third cell; and including the third cell in a layout diagram. At least one aspect of the method is executed by a processor of a computer.

Abstract: Methods and systems are described for using files or data (e.g., cookies) stored in network storage (e.g., the cloud) in lieu of files or data stored locally. A request for a plurality of files can be received from a device. The request can comprise a device identifier and a user identifier. The user identifier can be used to determine an associated account. A format for the requested plurality of files can be determined based on the device identifier. In an aspect, the device can have limited/no local persistent storage. Prior to transmission, the requested plurality of files can be formatted according to the determined format. For example, a user can access an HTML application from a device with limited/no local persistent storage, such as a set-top box. The device can request a plurality of files, such as cookies, from persistent storage. The persistent storage can be cloud storage.

Abstract: An anomaly detection model training method, anomaly detection methods, and load detection devices for household electricity are provided. The anomaly detection method is applied to the load detection device, which includes a processing unit and an anomaly detection model. The processing unit trains the anomaly detection model and performs an anomaly detection method.

Abstract: A slide rail assembly includes a first rail, a second rail, a slide assisting device, an elastic member and a working member. The second rail and the first rail are movable relative to each other. The elastic member is arranged on the second rail. During a process of the second rail being moved relative to the first rail along an opening direction, the working member is configured to contact the elastic member in an initial state in order to drive the slide assisting device to move along the opening direction to a predetermined position. When the slide assisting device is located at the predetermined position, the elastic member releases an elastic force through a predetermined space of the first rail, such that the elastic member is no longer in the initial state with the working member no longer contacting the elastic member.

Abstract: A method for the automatic scheduling of tasks obtains data processing tasks and data sources. A job queue is formed based on the data processing tasks. The job tasks are extracted in order from the job queue. Computing resources are distributed based on the extracted job tasks. A result of the data processing task is obtained by the pre-trained model based on the data source. An electronic device and a computer readable storage medium applying the method are also provided.

Abstract: An optical lens assembly includes, from an object side to an image side, at least four optical lens elements. At least one of the at least four optical lens elements includes an anti-reflective coating. The at least one optical lens element including the anti-reflective coating is made of a plastic material. The anti-reflective coating is arranged on an object-side surface or an image-side surface of the at least one optical lens element including the anti-reflective coating. The anti-reflective coating includes at least one coating layer. One of the at least one coating layer at the outer of the anti-reflective coating is made of ceramics. The anti-reflective coating includes a plurality of holes, and sizes of the plurality of holes adjacent to the outer of the anti-reflective coating are larger than sizes of the plurality of holes adjacent to the inner of the anti-reflective coating.

Abstract: An optical lens assembly includes, from an object side to an image side, at least four optical lens elements. At least one of the at least four optical lens elements includes an anti-reflective coating. The at least one optical lens element including the anti-reflective coating is made of a plastic material. The anti-reflective coating is arranged on an object-side surface or an image-side surface of the at least one optical lens element including the anti-reflective coating. The anti-reflective coating includes at least one coating layer. One of the at least one coating layer at the outer of the anti-reflective coating is made of ceramics. The anti-reflective coating includes a plurality of holes, and sizes of the plurality of holes adjacent to the outer of the anti-reflective coating are larger than sizes of the plurality of holes adjacent to the inner of the anti-reflective coating.

Abstract: A nanomaterial composition for magnetic field-induced electrical stimulation of cells includes a piezoelectric nanoparticle and a magnetic nanodisc. The piezoelectric nanoparticle is conjugated to a first molecule of a specific binding molecule pair and is coated with a cell-binding molecule. The magnetic nanodisc is conjugated to a second molecule of the specific binding molecule pair and is attached to the piezoelectric nanoparticle through bonding of the second molecule and the first molecule. The magnetic nanodisc converts a magnetic energy into a mechanical energy in the presence of an external magnetic field, and the mechanical energy is then applied to the piezoelectric nanoparticle that is in contact with the cells via the cell-binding molecule, such that the piezoelectric nanoparticle converts the mechanical energy into an electrical energy, so as to electrically stimulate the cells. A method for magnetic field-induced electrical stimulation of cells in a subject is also provided.

Abstract: A slide rail assembly includes a first rail, a second rail, a slide-facilitating device, and a retaining member. The second rail is movably mounted in a channel of, and is longitudinally displaceable with respect to, the first rail. The slide-facilitating device is movably mounted between the rails and includes an engaging feature. The retaining member is provided on the first rail and includes an elastic portion with a predetermined feature. The first rail includes a limiting feature for preventing deformation of the elastic portion. When the second rail is moved out of the channel after displacement in an opening direction with respect to the first rail, the slide-facilitating device is at a predetermined position, with the engaging feature engaged with the predetermined feature.

Abstract: Some implementations described herein include operating components in a lithography system at variable speeds to reduce, minimize, and/or prevent particle generation due to rubbing of or collision between contact parts of the components. In some implementations, a component in a path of transfer of a semiconductor substrate in the lithography system is operated at a relatively high movement speed through a first portion of an actuation operation, and is operated at a reduced movement speed (e.g., a movement speed that is less than the high movement speed) through a second portion of the actuation operation in which contact parts of the component are to interact. The reduced movement speed reduces the likelihood of particle generation and/or release from the contact parts when the contact parts interact, while the high movement speed provides a high semiconductor substrate throughput in the lithography system.

Abstract: An HEMT includes a gallium nitride layer. An aluminum gallium nitride layer is disposed on the gallium nitride layer. A gate is disposed on the aluminum gallium nitride layer. The gate includes a P-type gallium nitride and a schottky contact layer. The P-type gallium nitride contacts the schottky contact layer, and a top surface of the P-type gallium nitride entirely overlaps a bottom surface of the schottky contact layer. A protective layer covers the aluminum gallium nitride layer and the gate. A source electrode is disposed at one side of the gate, penetrates the protective layer and contacts the aluminum gallium nitride layer. A drain electrode is disposed at another side of the gate, penetrates the protective layer and contacts the aluminum gallium nitride layer. A gate electrode is disposed directly on the gate, penetrates the protective layer and contacts the schottky contact layer.

Abstract: A slide rail assembly includes a supporting frame, a first rail, a second rail and a third rail. The first rail is movable relative to the supporting frame. The second rail is movable relative to the first rail. The third rail is movable relative to the second rail. When the slide rail assembly is at an extending state, the first rail is located at a predetermined position relative to the supporting frame, the second rail is located at an extended position relative to the first rail, the third rail is located at an opened position relative to the second rail and a rear rail section of the third rail is overlapped with a front rail section of the first rail.

Abstract: A slide rail assembly includes a first rail, a second rail, an auxiliary member, a blocking member and an operating member. The auxiliary member is arranged on the second rail. The blocking member is pivotally connected to the second rail. When the second rail is located at an extended position relative to the first rail, a blocking feature on the first rail blocks the blocking member in a first state for preventing the second rail from displacing away from the extended position along a retracting direction. When the operating member moves from a first operating position to a second operating position to drive the blocking member to move to a second state, the blocking feature does not block the blocking member in the second state, and the operating member engages with a predetermined portion of the auxiliary member to retain the operating member at the second operating position.