Abstract: In a method of manufacturing a semiconductor device, underlying structures comprising gate electrodes and source/drain epitaxial layers are formed, one or more layers are formed over the underlying structures, a hard mask layer is formed over the one or more layers, one or more first resist layers are formed over the hard mask layer, a first photo resist pattern is formed over the one or more first resist layers, a width of the first photo resist pattern is adjusted, the one or more first resist layers are patterned by using the first photo resist pattern as an etching mask, thereby forming a first hard mask pattern, and the hard mask layer is patterned by using the first hard mask pattern, thereby forming a second hard mask pattern.

Abstract: A method and system for processing online/offline multimedia data are disclosed. The system comprises a remote mainframe, a local host and a portable apparatus. When the portable apparatus is electrically connected with the remote mainframe and the local host, the portable apparatus can immediately exchange multimedia data exchange with the remote mainframe and the local host. When the portable apparatus is not electrically connected with the remote mainframe and the local host, the portable apparatus can independently process the multimedia data previously received from the remote mainframe and the local host; also the portable apparatus can update the multimedia data with the remote mainframe and the local host when the portable apparatus is electrically reconnected with the remote mainframe and the local host. With the system configuration, the present invention features online/offline multimedia-data processing capabilities.