Patents by Inventor Chun-geun Park
Chun-geun Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20100151389Abstract: Disclosed is a photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also disclosed is a method of forming barrier ribs for LCD pixels using such photosensitive resin composition.Type: ApplicationFiled: September 22, 2009Publication date: June 17, 2010Applicant: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Chun Geun Park, Moo Young Lee, Seok Han, Seung Keun Kim, In Kyung Sung, Hag Ju Lee
-
Patent number: 6713229Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: May 21, 2002Date of Patent: March 30, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
-
Publication number: 20020132186Abstract: Copolymers and terpolyers are used in chemically amplified resists.Type: ApplicationFiled: May 21, 2002Publication date: September 19, 2002Inventors: Sang-Jun Choi, Chun-Geun Park, Young-Bum Koh
-
Patent number: 6416927Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: September 29, 2000Date of Patent: July 9, 2002Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
-
Patent number: 6300036Abstract: The compounds are of a class of photosensitive polymers for use in chemically amplified photoresists. These photoresists produce sharp line patterns when exposed with an ArF excimer laser. The polymer composition includes a copolymer and the photoresist composition includes a terpolymer with a photo acid generator. The resulting chemically amplified photoresist compositions have strong resistance to dry etching, possess excellent adhesion to film material, and are capable of being developed using conventional developers.Type: GrantFiled: December 1, 1998Date of Patent: October 9, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-Jun Choi, Yool Kang, Dong-Won Jung, Chun-Geun Park
-
Patent number: 6280903Abstract: Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof. R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: July 17, 2000Date of Patent: August 28, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Yool Kang, Sang-Jun Choi, Dong-Won Jung, Chun-Geun Park, Young-Bum Koh
-
Patent number: 6171754Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: July 29, 1998Date of Patent: January 9, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
-
Patent number: 6114084Abstract: Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof, R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: October 2, 1998Date of Patent: September 5, 2000Assignee: Samsung Electronics Co. Ltd.Inventors: Yool Kang, Sang-Jun Choi, Dong-Won Jung, Chun-Geun Park, Young-Bum Koh
-
Patent number: 6103845Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: February 27, 1997Date of Patent: August 15, 2000Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
-
Patent number: 5981141Abstract: In general, the invention provides polymers which may be used in chemically amplified resists. More particularly, the invention relates to esterified polymers containing the group: ##STR1## Resist compositions comprise the esterified polymers and photoacid generators.Type: GrantFiled: October 1, 1997Date of Patent: November 9, 1999Assignee: Samsung Electrics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Hai-won Lee
-
Patent number: 5856411Abstract: Resins for use in chemically amplified resists are represented by the general formula (I): ##STR1## wherein R.sub.1 is t-butyl or tetrahydropyranyl; R.sub.2 is hydrogen or methyl; n and m are integers; and the ratio n/((m+n) ranges from 0.1 to 0.9. Methods for manufacturing the resins comprise reacting a monomer represented by the formula (II): ##STR2## with a monomer represented by the formula (III): ##STR3## to form a copolymer represented by the formula (IV): ##STR4## wherein R.sub.1 and R.sub.2 are defined as above; and hydrolyzing acetoxy groups contained in the copolymer represented by the formula (IV) to form the resin compositions.Type: GrantFiled: June 17, 1996Date of Patent: January 5, 1999Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park
-
Patent number: 5851727Abstract: Photosensitive polymers are represented by the formula: ##STR1## wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.Type: GrantFiled: May 30, 1997Date of Patent: December 22, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
-
Patent number: 5847063Abstract: Resins for use in chemically amplified resists are represented by the general formula (I): ##STR1## wherein R.sub.1 is t-butyl or tetrahydropyranyl; R.sub.2 is hydrogen or methyl; n and m are integers; and the ratio n/((m+n) ranges from 0.1 to 0.9. Methods for manufacturing the resins comprise reacting a monomer represented by the formula (II): ##STR2## with a monomer represented by the formula (III): ##STR3## to form a copolymer represented by the formula (IV): ##STR4## wherein R.sub.1 and R.sub.2 are defined as above; and hydrolyzing acetoxy groups contained in the copolymer represented by the formula (IV) to form the resin compositions.Type: GrantFiled: April 16, 1997Date of Patent: December 8, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park
-
Patent number: 5759755Abstract: A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.Type: GrantFiled: April 14, 1997Date of Patent: June 2, 1998Assignee: Samsung Electronics, Co., Ltd.Inventors: Chun-geun Park, Gi-sung Yeo, Jung-chul Park
-
Patent number: 5733704Abstract: A resist composition by which high resolution patterns can be formed in a lithography process, due to its high sensitivity to light and large difference in solubilities in a developing solution before and after exposure to light, and which has excellent thermal characteristics. The resist composition is suitable for manufacturing highly integrated semiconductor chips.Type: GrantFiled: August 30, 1996Date of Patent: March 31, 1998Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park
-
Patent number: 5593725Abstract: A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.Type: GrantFiled: September 12, 1994Date of Patent: January 14, 1997Assignee: Samsung Electronics Co., Ltd.Inventors: Chun-geun Park, Gi-sung Yeo, Jung-chul Park
-
Patent number: 5496770Abstract: A connection bump of a semiconductor chip is formed by a photoresist pattern. The photoresist pattern is obtained through an exposure process by which photolithography solution layers of positive and/or negative type are repeatedly exposed and thereafter developed to obtain a photoresist pattern corresponding to the connection bump. Since the upper portion of the manufactured bump is no larger than the lower portion thereof, the bumps do not contact each other even though the upper portion of the bump is stretched due to a pressure induced during a process of bonding internal leads in a TAB package. The connection bump formed according to the present invention has a high aspect ratio, thereby preventing the internal leads from contacting the semiconductor chip surface and advantageously facilitating the removal of the photoresist pattern after the bump formation process to simplify overall manufacturing process.Type: GrantFiled: February 8, 1994Date of Patent: March 5, 1996Assignee: Samsung Electronics Co., Ltd.Inventor: Chun-Geun Park
-
Patent number: 5418186Abstract: A method for manufacturing a bump on a semiconductor comprising the steps of: forming metal pad on a portion of a surface of a substrate, forming a barrier metal layer over the surface of the substrate such that the barrier metal layer cover the metal pad, forming a photoresist layer over the barrier metal layer, forming an opening in the photoresist layer to expose a portion of the barrier metal layer overlaying the metal pad, forming a chip bump in the opening, selectively removing the photoresist layer using the bump as a mask, such that residual portions of the photoresist layer remain, and such that portions of the barrier metal layer are exposed, etching the exposed portions of the barrier metal layer using the residual photoresist layer as a mask, and removing the residual photoresist layer.Type: GrantFiled: July 15, 1994Date of Patent: May 23, 1995Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-han Park, Chun-geun Park, Seon-ho Ha