Abstract: A dynamic power monitor for monitoring a power of a block in an integrated circuit is provided. The dynamic power monitor includes an input buffer configured to store first state values corresponding to internal signals of the block according to a first cycle of a clock signal; a power calculator configured to identify first power classification values corresponding to the block according to the first cycle, based on the first state values; and a filter configured to identify a first filtered value of the first power classification values.

Abstract: A dynamic power monitor for monitoring a power of a block in an integrated circuit is provided. The dynamic power monitor includes an input buffer configured to store first state values corresponding to internal signals of the block according to a first cycle of a clock signal; a power calculator configured to identify first power classification values corresponding to the block according to the first cycle, based on the first state values; and a filter configured to identify a first filtered value of the first power classification values.

Abstract: A test system is provided. Said test system comprises a device under test, a measurement equipment, and a remote source simulator. In this context, the remote source simulator is adapted to simulate a remote video source, wherein the remote video source is adapted to transmit a video comprising at least one detection pattern to the device under test. Furthermore, the device under test is adapted to display the video. In addition to this, the measurement equipment is adapted to detect the at least one detection pattern with respect to the device under test and to determine the number of detection patterns having been received by the device under test.

Abstract: A test system is provided. Said test system comprises a device under test, a measurement equipment, and a remote source simulator. In this context, the remote source simulator is adapted to simulate a remote video source, wherein the remote video source is adapted to transmit a video comprising at least one detection pattern to the device under test. Furthermore, the device under test is adapted to display the video. In addition to this, the measurement equipment is adapted to detect the at least one detection pattern with respect to the device under test and to determine the number of detection patterns having been received by the device under test.

Abstract: The present invention provides a testing system for a video and audio reproduction system, the testing system comprising a data source, comprising video and audio data for reproduction by the video and audio reproduction system, the video and audio data comprising unique marks in every video frame and every audio frame, a recording unit, configured to record a video stream and an audio stream generated by the video and audio reproduction system based on the video and audio data, and a test processor, configured to extract the unique marks from the recorded video stream and the recorded audio stream, and to verify if respective unique marks of simultaneous video frames and audio frames have been recorded by the recording unit simultaneously. Furthermore, the present invention provides a testing method, a computer program product, and a non-transitory computer readable data carrier.

Abstract: A reticle that is within specifications is inspected to generate baseline candidate defects and their location and size. After using the reticle in photolithography, the reticle is inspected to generate current candidate defects and their location and size. An inspection report of filtered candidate defects and their images is generated so that these candidate defects include a first subset of the current candidate defects and their images and exclude a second subset of the current candidate defects and their images. Each of the first subset of candidate defects has a location and size that fails to match any baseline candidate defect's location and size, and each of the excluded second subset of candidate defects has a location and size that matches a baseline candidate defect's location and size.

Abstract: A measuring system for measuring video processing quality of a device under test includes a measuring device comprising transmission means set up for transmitting a video to the device under test. The device under test is set up for receiving the video and displaying it using a display included by the device under test. The video includes at least a first barcode to be displayed for a first duration. The measuring system includes a barcode reader set up for reading the first barcode from the display of the device under test. The measuring system is set up for determining the video processing quality of the device under test based upon measuring results of the barcode reader.

Abstract: The present invention provides a testing system for a video and audio reproduction system, the testing system comprising a data source, comprising video and audio data for reproduction by the video and audio reproduction system, the video and audio data comprising unique marks in every video frame and every audio frame, a recording unit, configured to record a video stream and an audio stream generated by the video and audio reproduction system based on the video and audio data, and a test processor, configured to extract the unique marks from the recorded video stream and the recorded audio stream, and to verify if respective unique marks of simultaneous video frames and audio frames have been recorded by the recording unit simultaneously. Furthermore, the present invention provides a testing method, a computer program product, and a non-transitory computer readable data carrier.

Abstract: A reticle that is within specifications is inspected to generate baseline candidate defects and their location and size. After using the reticle in photolithography, the reticle is inspected to generate current candidate defects and their location and size. An inspection report of filtered candidate defects and their images is generated so that these candidate defects include a first subset of the current candidate defects and their images and exclude a second subset of the current candidate defects and their images. Each of the first subset of candidate defects has a location and size that fails to match any baseline candidate defect's location and size, and each of the excluded second subset of candidate defects has a location and size that matches a baseline candidate defect's location and size.

Abstract: A reticle that is within specifications is inspected so as to generate a baseline event indicating a location and a size value for each unusual reticle feature. After using the reticle in photolithography, the reticle is inspected so as to generate a current event indicating a location and a size value for each unusual reticle feature. An inspection report of candidate defects and their images is generated so that these candidate defects include a first subset of the current events and their corresponding candidate defect images and exclude a second subset of the current events and their corresponding excluded images. Each of the first included events has a location and size value that fails to match any baseline event's location and size value, and each of the excluded second events has a location and size value that matches a baseline event's location and size value.

Abstract: A measuring system for measuring video processing quality of a device under test includes a measuring device comprising transmission means set up for transmitting a video to the device under test. The device under test is set up for receiving the video and displaying it using a display included by the device under test. The video includes at least a first barcode to be displayed for a first duration. The measuring system includes a barcode reader set up for reading the first barcode from the display of the device under test. The measuring system is set up for determining the video processing quality of the device under test based upon measuring results of the barcode reader.

Abstract: A reticle that is within specifications is inspected so as to generate a baseline event indicating a location and a size value for each unusual reticle feature. After using the reticle in photolithography, the reticle is inspected so as to generate a current event indicating a location and a size value for each unusual reticle feature. An inspection report of candidate defects and their images is generated so that these candidate defects include a first subset of the current events and their corresponding candidate defect images and exclude a second subset of the current events and their corresponding excluded images. Each of the first included events has a location and size value that fails to match any baseline event's location and size value, and each of the excluded second events has a location and size value that matches a baseline event's location and size value.

Abstract: A semiconductor inspection apparatus identifies regions of a reticle or semiconductor wafer appropriate for cell-to-cell inspection by analyzing a semiconductor design database. Appropriate regions can be identified in a region map for use by offline inspection tools.

Abstract: A semiconductor inspection apparatus identifies regions of a reticle or semiconductor wafer appropriate for cell-to-cell inspection by analyzing a semiconductor design database. Appropriate regions can be identified in a region map for use by offline inspection tools.

Abstract: A technique, associated system and program code, for retrieving depth information about at least one surface of an object, such as an anatomical feature. Core features include: projecting a composite image comprising a plurality of modulated structured light patterns, at the anatomical feature; capturing an image reflected from the surface; and recovering pattern information from the reflected image, for each of the modulated structured light patterns. Pattern information is preferably recovered for each modulated structured light pattern used to create the composite, by performing a demodulation of the reflected image. Reconstruction of the surface can be accomplished by using depth information from the recovered patterns to produce a depth map/mapping thereof.

Abstract: A technique, associated system and program code, for retrieving depth information about at least one surface of an object, such as an anatomical feature. Core features include: projecting a composite image comprising a plurality of modulated structured light patterns, at the anatomical feature; capturing an image reflected from the surface; and recovering pattern information from the reflected image, for each of the modulated structured light patterns. Pattern information is preferably recovered for each modulated structured light pattern used to create the composite, by performing a demodulation of the reflected image. Reconstruction of the surface can be accomplished by using depth information from the recovered patterns to produce a depth map/mapping thereof.

Abstract: A technique, associated system and program code, for retrieving depth information about at least one surface of an object. Core features include: projecting a composite image comprising a plurality of modulated structured light patterns, at the object; capturing an image reflected from the surface; and recovering pattern information from the reflected image, for each of the modulated structured light patterns. Pattern information is preferably recovered for each modulated structured light pattern used to create the composite, by performing a demodulation of the reflected image. Reconstruction of the surface can be accomplished by using depth information from the recovered patterns to produce a depth map/mapping thereof.

Abstract: A technique, associated system and program code, for retrieving depth information about at least one surface of an object. Core features include: projecting a composite image comprising a plurality of modulated structured light patterns, at the object; capturing an image reflected from the surface; and recovering pattern information from the reflected image, for each of the modulated structured light patterns. Pattern information is preferably recovered for each modulated structured light pattern used to create the composite, by performing a demodulation of the reflected image. Reconstruction of the surface can be accomplished by using depth information from the recovered patterns to produce a depth map/mapping thereof.